Assignment of Assignor's Interest

Recorded: 2020-07-15 Pages: 2

Assignors

TAKAHASHI, HISATO

Executed: 2020-06-26

HANANO, MASAYUKI

Executed: 2020-06-26

TAKIZAWA, TOSHIO

Executed: 2020-06-26

Assignee

HITACHI CHEMICAL COMPANY, LTD.

9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN

Covered Property (1)

Polishing Liquid, Polishing Liquid Set, Polishing Method, Anddefect Suppression Method

Application: 16/652,451 →

Publication: US 2020/0283659

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.