Patent Assignment
Reel/Frame 053718/0758
Assignment of Assignor's Interest
Recorded: 2020-09-08
Pages: 2
Assignors
MATSUI, MIYAKO
Executed: 2020-06-04
KUWAHARA, KENICHI
Executed: 2020-06-15
USUI, TATEHITO
Executed: 2020-06-04
KOBAYASHI, HIROYUKI
Executed: 2020-04-27
Assignee
HITACHI HIGH-TECH CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Plasma Processing Method and Plasma Processing Apparatus