IP Library Assignment 054331/0076
Patent Assignment
Reel/Frame 054331/0076

Assignment of Assignor's Interest

Recorded: 2020-11-11 Pages: 4
Assignors
LAI, TE-YANG
Executed: 2020-09-29
PENG, CHUN-YEN
Executed: 2020-10-05
YEONG, SAI-HOOI
Executed: 2020-10-15
CHUI, CHI ON
Executed: 2020-10-19
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Dipole-Engineered High-K Gate Dielectric and Method Forming Same
Application: 17/094,241 →
Publication: US 2021/0375629