IP Library › Assignment 054561/0401
Patent Assignment
Reel/Frame 054561/0401

Assignment of Assignor's Interest

Recorded: 2020-12-07 Pages: 4
Assignors
LAI, BO-YU
Executed: 2019-05-06
LEE, KAI-HSUAN
Executed: 2019-05-06
LEE, WEI-YANG
Executed: 2019-05-06
YANG, FENG-CHENG
Executed: 2019-05-06
CHEN, YEN-MING
Executed: 2019-05-06
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Air Gap Formation Between Gate Spacer and Epitaxy Structure
Application: 17/113,209 →
Publication: US 2021/0118749