IP Library Assignment 054705/0163
Patent Assignment
Reel/Frame 054705/0163

Assignment of Assignor's Interest

Recorded: 2020-12-21 Pages: 6
Assignors
ETORI, HIDEKI
Executed: 2020-10-22
KITAMURA, KEIKO
Executed: 2020-10-28
FUSE, YOSHIAKI
Executed: 2020-11-06
KOMURO, NOBUHITO
Executed: 2020-11-06
Assignees
SHOWA DENKO MATERIALS CO., LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
KIMOTO CO., LTD.
6-35, SUZUYA 4-CHOME, CHUO-KU, SAITAMA-SHI, SAITAMA, 338-0013, JAPAN
Covered Property (1)
Photosensitive Film and Method for Forming Permanent Mask Resist
Application: 17/055,264 →
Publication: US 2021/0124267
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Feb 9, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062643/0480 →
Change of Address Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →