IP Library Assignment 062643/0480
Patent Assignment
Reel/Frame 062643/0480

Change of Name

Recorded: 2023-02-09 Pages: 11
Assignor
SHOWA DENKO MATERIALS CO., LTD.
Executed: 2023-01-01
Assignee
RESONAC CORPORATION
13-9, SHIBA DAIMON 1-CHOME, MINATO-KU, TOKYO, 105-8518, JAPAN
Covered Property (1)
Photosensitive Film and Method for Forming Permanent Mask Resist
Application: 17/055,264 →
Publication: US 2021/0124267
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 21, 2020
From: ETORI, HIDEKI; KITAMURA, KEIKO; FUSE, YOSHIAKI; KOMURO, NOBUHITO
To: SHOWA DENKO MATERIALS CO., LTD.; KIMOTO CO., LTD.
Reel/Frame 054705/0163 →
Change of Address Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →