Patent Assignment
Reel/Frame 056175/0519
Assignment of Assignor's Interest
Recorded: 2021-05-07
Pages: 3
Assignors
HUANG, YAO-SHENG
Executed: 2021-05-04
CHANG, I-MING
Executed: 2021-05-07
CHAO, HUANG-LIN
Executed: 2021-05-04
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property
(1)
Method for Forming Epitaxial Source/Drain Features Using a Self-Aligned Mask and Semiconductor Devices Fabricated Thereof