Patent Assignment
Reel/Frame 056947/0366
Assignment of Assignor's Interest
Recorded: 2021-07-22
Pages: 7
Assignors
AKAGI, DAIJIRO
Executed: 2021-06-30
KAWAHARA, HIROTOMO
Executed: 2021-06-17
UNO, TOSHIYUKI
Executed: 2021-06-17
ISHIKAWA, ICHIRO
Executed: 2021-06-18
SASAKI, KENICHI
Executed: 2021-06-18
Assignee
AGC INC.
5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8405, JAPAN
Covered Property
(1)
Reflective Mask Blank for Euv Lithography, Mask Blank for Euv Lithography, and Manufacturing Methods Thereof