IP Library Assignment 058208/0142
Patent Assignment
Reel/Frame 058208/0142

Assignment of Assignor's Interest

Recorded: 2021-11-24 Pages: 8
Assignors
ISHIBASHI, NAOTO
Executed: 2021-11-22
MURATA, KOICHI
Executed: 2021-11-22
TSUCHIDA, HIDEKAZU
Executed: 2021-11-22
Assignee
SHOWA DENKO K.K.
13-9, SHIBA DAIMON 1-CHOME, MINATO-KU, TOKYO, 105-8518, JAPAN
Covered Property (1)
SiC EPITAXIAL WAFER AND METHOD FOR PRODUCING SiC EPITAXIAL WAFER
Application: 17/456,506 →
Publication: US 2022/0173001
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →