IP Library Assignment 058550/0322
Patent Assignment
Reel/Frame 058550/0322

Assignment of Assignor's Interest

Recorded: 2022-01-05 Pages: 4
Assignors
KITAMURA, HIROSHI
Executed: 2022-01-05
MASUDA, TSUYOSHI
Executed: 2022-01-05
MATSUMURA, YOSHIYUKI
Executed: 2022-01-05
NAMIKI, AKIHISA
Executed: 2022-01-05
SAITO, TAKESHI
Executed: 2022-01-05
Assignee
CMC MATERIALS KK
1287-19 KITAKOYAMA, GEINO-CHO, TSU-SHI, MIE, 514-2213, JAPAN
Covered Property (1)
Chemical-Mechanical Polishing Composition, Rinse Composition, Chemical-Mechanical Polishing Method, and Rinsing Method
Application: 17/620,181 →
Publication: US 2022/0372329
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Security Interest Jul 8, 2022
From: CMC MATERIALS, INC.; INTERNATIONAL TEST SOLUTIONS, LLC; QED TECHNOLOGIES INTERNATIONAL, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 060615/0001 →
Merger Nov 28, 2023
From: CMC MATERIALS KK
To: ENTEGRIS JAPAN CO., LTD.
Reel/Frame 065686/0902 →
Assignment of Assignor's Interest Dec 4, 2023
From: ENTEGRIS JAPAN CO., LTD.
To: ENTEGRIS, INC.
Reel/Frame 065746/0789 →