Patent Assignment
Reel/Frame 058887/0226
Assignment of Assignor's Interest
Recorded: 2022-02-04
Pages: 12
Assignors
NAKATANI, YUSUKE
Executed: 2022-01-06
TANAKA, KAZUUMI
Executed: 2022-01-07
YAMAOKA, MASAHIRO
Executed: 2022-01-07
SONODA, YASUSHI
Executed: 2022-01-07
IWASE, TAKU
Executed: 2022-01-07
Assignee
HITACHI HIGH-TECH CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Ion Shield Plate for Plasma Processing Apparatus
Patent:
1,008,986 →
Application:
29/789,929 →