IP Library › Granted Patent US 1,008,986
Granted Patent S1
US 1,008,986 · App. 29/789,929 · Granted Dec 26, 2023

Ion shield plate for plasma processing apparatus

Inventors: Yusuke Nakatani (Tokyo, JP); Kazuumi Tanaka (Tokyo, JP); Masahiro Yamaoka (Tokyo, JP); Yasushi Sonoda (Tokyo, JP); Taku Iwase (Tokyo, JP)
Assignee: Hitachi High-Tech Corporation
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Quick Facts
Patent No.
US 1,008,986
App. No.
29/789,929
Granted
Dec 26, 2023
Kind
S1
Claims (1)

The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2022
From: NAKATANI, YUSUKE; TANAKA, KAZUUMI; YAMAOKA, MASAHIRO; SONODA, YASUSHI; IWASE, TAKU
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 058887/0226 →
Priority Claims (1)
JP 2021-008852 D · Apr 26, 2021 · national