Assignment of Assignor's Interest

Recorded: 2022-05-20 Pages: 8

Assignors

KASAI, TATSUYA

Executed: 2022-05-03

MATSUKI, TOMOHIRO

Executed: 2022-04-28

ANNO, YUSUKE

Executed: 2022-05-04

SEKO, TOMOAKI

Executed: 2022-05-11

SAKAI, TATSUYA

Executed: 2022-04-20

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Composition, Silicon-Containing Film, Method of Forming Silicon-Containing Film, and Method of Treating Semiconductor Substrate

Application: 17/584,456 →

Publication: US 2022/0146940

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.