Assignment of Assignor's Interest

Recorded: 2022-12-07 Pages: 7

Assignors

SEKO, TOMOAKI

Executed: 2022-10-14

SAKAI, TATSUYA

Executed: 2022-10-14

SAKAI, KAZUNORI

Executed: 2022-10-13

ANNO, YUSUKE

Executed: 2022-10-13

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Composition for Resist Underlayer Film Formation, and Method of Producing Semiconductor Substrate

Application: 17/961,611 →

Publication: US 2023/0069221

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.