IP Library Assignment 062620/0549
Patent Assignment
Reel/Frame 062620/0549

Assignment of Assignor's Interest

Recorded: 2023-02-07 Pages: 3
Assignors
CHEN, HONG-CHIH
Executed: 2023-01-18
LIN, TA-CHUN
Executed: 2023-01-29
LIAW, JHON-JHY
Executed: 2023-01-18
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Semiconductor Structure Including Gate Spacer Layer and Dielectric Layer Having Portion Lower Than Top Surface of Gate Spacer Layer
Application: 18/163,785 →
Publication: US 2024/0266410