Assignment of Assignor's Interest

Recorded: 2023-04-12 Pages: 10

Assignors

ICHIKAWA, KENJIRO

Executed: 2023-03-07

GODA, AYUMI

Executed: 2023-03-07

NAKANO, HIDEAKI

Executed: 2023-03-07

YAMAGATA, YUTO

Executed: 2023-03-07

Assignee

TOPPAN PHOTOMASK CO., LTD.

3-19-26, SHIBAURA, MINATO-KU, TOKYO, 108-0023, JAPAN

Covered Property (1)

Reflective Mask and Method for Producing Reflective Mask

Application: 18/031,321 →

Publication: US 2024/0019776

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.