Assignment of Assignor's Interest

Recorded: 2023-04-13 Pages: 4

Assignor

SUZUKI, ATSUSHI

Executed: 2023-02-17

Assignee

RESONAC CORPORATION

13-9, SHIBADAIMON 1-CHOME, MINATO-KU, TOKYO, 105-8518, JAPAN

Covered Property (1)

Etching Gas, Method for Producing Same, Etching Method, and Method for Producing Semiconductor Device

Application: 18/031,801 →

Publication: US 2023/0386853

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.