Assignment of Assignor's Interest

Recorded: 2023-08-24 Pages: 3

Assignor

TOPPAN INC.

Executed: 2023-08-23

Assignee

TOPPAN PHOTOMASK CO., LTD.

3-19-26, SHIBAURA, MINATO-KU, TOKYO, 108-0023, JAPAN

Covered Property (1)

Reflective Mask and Production Method for Reflective Mask

Application: 17/772,340 →

Publication: US 2022/0404693

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.