Patent Assignment
Reel/Frame 066823/0811
Assignment of Assignor's Interest
Recorded: 2024-03-19
Pages: 9
Assignors
YUN, JONG WOOK
Executed: 2024-02-28
SHIN, YUJIN
Executed: 2024-02-28
MOON, SUYOUNG
Executed: 2024-02-28
MIN, EUN GI
Executed: 2024-02-28
HONG, TAE IL
Executed: 2024-02-28
SEO, JANGWON
Executed: 2024-02-28
JI, MIN GYEONG
Executed: 2024-02-28
Assignee
SK ENPULSE CO., LTD.
1043, GYEONGGI-DAERO, PYEONGTAEK-SI, GYEONGGI-DO, 17784, KOREA, REPUBLIC OF
Covered Property
(1)
Polishing Pad with Adjusted Content of Chlorine and Process for Preparing Semiconductor Device Using the Same
Application:
18/609,288 →
Publication:
US 2024/0342857
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.