IP Library Assignment 071277/0667
Patent Assignment
Reel/Frame 071277/0667

Assignment of Assignor's Interest

Recorded: 2025-06-02 Pages: 6
Assignor
SK ENPULSE CO., LTD.
Executed: 2025-04-25
Assignee
ENPULSE CO., LTD.
3RD FLOOR, 3-DONG, 112, SEONGGEO-GIL, SEONGGEO-EUP, SEOBUK-GU, CHEONAN-SI, CHUNGCHEONGNAM-DO, 31044, KOREA, REPUBLIC OF
Covered Properties (44)
Polishing Pad with Adjusted Crosslinking Degree and Process for Preparing the Same
Application: 17/002,386 →
Publication: US 2021/0129284
Polishing Pad, Preparation Method Thereof, and Preparation Method of Semiconductor Device Using Same
Application: 17/104,829 →
Publication: US 2021/0162560
Polishing Pad, Preparation Method Thereof, and Preparation Method of Semiconductor Device Using Same
Application: 17/101,363 →
Publication: US 2021/0154797
Polishing Pad, Preparation Method Thereof and Method for Preparing Semiconductor Device Using Same
Application: 18/783,438 →
Publication: US 2025/0018526
Polishing Pad and Method for Preparing Semiconductor Device Using the Same
Application: 17/399,849 →
Publication: US 2022/0059401
Polishing Pad and Method for Preparing a Semiconductor Device Using the Same
Application: 17/731,410 →
Publication: US 2022/0410337
Polishing Pad with Improved Wettability and Method for Preparing Same
Application: 18/298,378 →
Publication: US 2023/0330806
Method for Manufacturing a Polishing Sheet and a Polishing Pad
Application: 18/361,910 →
Publication: US 2024/0066661
Polishing Pad and Preparation Method Thereof
Application: 18/581,387 →
Publication: US 2024/0308022
Polishing Pad and Method of Monitoring a Polishing Process Using the Same
Application: 18/538,695 →
Publication: US 2024/0227113
Polishing Pad, Pyrolysis Oil Obtained Therefrom, and Process for Preparing the Same
Application: 18/413,034 →
Publication: US 2024/0263080
Polishing Pad with Adjusted Content of Chlorine and Process for Preparing Semiconductor Device Using the Same
Application: 18/609,288 →
Publication: US 2024/0342857
Polishing Pad with Improved Slurry Flowability and Process for Preparing a Semiconductor Device Using the Same
Application: 18/817,224 →
Publication: US 2025/0144764
Polishing Pad and Process for Preparing the Same
Application: 18/814,597 →
Publication: US 2025/0144763
Eco-Friendly Polishing Pad and Manufacturing Method Thereof
Application: 18/741,785 →
Publication: US 2025/0065467
Polishing Pad with Reduced Defect and Method of Preparing a Semiconductor Device Using the Same
Application: 18/747,451 →
Publication: US 2025/0033160
Polishing Pad and Method of Manufacturing a Semiconductor Device Using the Same
Application: 18/882,756 →
Publication: US 2025/0144766
Polishing Pad with Excellent Recyclability and Pyrolysis Oil Obtained Therefrom
Application: 18/884,117 →
Publication: US 2025/0144767
Conditioning Device and Method for Controlling the Conditioning Device
Application: 18/302,786 →
Publication: US 2023/0339072
Polishing Pad and Preparing Method of Semiconductor Device
Application: 18/590,378 →
Publication: US 2024/0300066
Porous Polyurethane Polishing Pad and Method for Manufacturing Same
Application: 16/462,180 →
Publication: US 2019/0329376
Polishing Pad and Method for Producing Same
Application: 16/479,824 →
Publication: US 2021/0354267
Polishing Pad Comprising Window Similar in Hardness to Polishing Layer
Application: 16/619,378 →
Publication: US 2020/0164483
Polishing Pad Having Excellent Airtightness
Application: 16/605,483 →
Publication: US 2021/0291314
Porous Polyurethane Polishing Pad and Preparation Method Thereof
Application: 16/108,607 →
Publication: US 2019/0061097
Porous Polyurethane Polishing Pad and Process for Preparing the Same
Application: 16/311,614 →
Publication: US 2021/0229237
Leakage-Proof Polishing Pad and Process for Preparing the Same
Application: 16/160,418 →
Publication: US 2019/0111542
Polishing Pad with Improved Fluidity of Slurry and Process for Preparing Same
Application: 16/395,993 →
Publication: US 2019/0389033
Porous Polishing Pad and Process for Producing the Same
Application: 16/385,653 →
Publication: US 2019/0314954
Porous Polyurethane Polishing Pad and Process for Producing the Same
Application: 16/389,711 →
Publication: US 2019/0321937
Composition for a Polishing Pad, Polishing Pad, and Process for Preparing the Same
Application: 16/721,284 →
Publication: US 2020/0207904
Polishing Pad That Minimizes Occurrence of Defects and Process for Preparing the Same
Application: 16/790,388 →
Publication: US 2020/0306921
Polishing Pad with Improved Crosslinking Density and Process for Preparing the Same
Application: 16/791,881 →
Publication: US 2020/0368873
Composition for Polishing Pad, Polishing Pad and Preparation Method Thereof
Application: 16/726,725 →
Publication: US 2020/0207981
Polishing Pad, Process for Preparing the Same, and Process for Preparing a Semiconductor Device Using the Same
Application: 17/002,427 →
Publication: US 2021/0129285
Polishing Pad, Process for Preparing the Same, and Process for Preparing a Semiconductor Device Using the Same
Application: 17/002,468 →
Publication: US 2021/0122006
Polishing Pad, Process for Preparing the Same, and Process for Preparing a Semiconductor Device Using the Same
Application: 17/592,706 →
Publication: US 2022/0152776
Composition for Polishing Pad, Polishing Pad and Preparation Method of Semiconductor Device
Application: 16/899,692 →
Publication: US 2020/0391344
Composition for Polishing Pad and Polishing Pad
Application: 17/077,360 →
Publication: US 2021/0122007
Polishing Pad, Preparation Method Thereof and Method for Preparing Semiconductor Device Using Same
Application: 17/349,285 →
Publication: US 2021/0394334
Polishing Pad, Preparation Method Thereof and Method for Preparing Semiconductor Device Using Same
Application: 17/349,367 →
Publication: US 2021/0394335
Porous Polyurethane Polishing Pad and Process for Preparing a Semiconductor Device by Using the Same
Application: 15/989,396 →
Publication: US 2018/0339393
Porous Polyurethane Polishing Pad and Process for Preparing a Semiconductor Device by Using the Same
Application: 15/989,403 →
Publication: US 2018/0339394
Polishing Pad and Method for Preparing Semiconductor Device Using Same
Application: 17/202,977 →
Publication: US 2021/0291315
Related Assignments (24)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest May 17, 2019
From: HEO, HYE YOUNG; SEO, JANG WON; HAN, HYUK HEE
To: SKC CO., LTD.
Reel/Frame 049216/0015 →
Assignment of Assignor's Interest Jul 22, 2019
From: RYOU, JOONSUNG; KWON, TAE KYOUNG; SEO, JANG WON; YUN, SUNGHOON
To: SKC CO., LTD.
Reel/Frame 049822/0259 →
Assignment of Assignor's Interest Dec 4, 2019
From: YUN, SUNGHOON; RYOU, JOONSUNG; SEO, JANG WON; AHN, JAEIN
To: SKC CO., LTD.
Reel/Frame 051179/0338 →
Assignment of Assignor's Interest Aug 25, 2020
From: YUN, JONG WOOK; JOENG, EUN SUN; SEO, JANG WON
To: SKC CO., LTD.
Reel/Frame 053592/0985 →
Assignment of Assignor's Interest Nov 23, 2020
From: HEO, HYEYOUNG; YUN, SUNGHOON; SEO, JANG WON; YUN, JONG WOOK
To: SKC CO., LTD.
Reel/Frame 054444/0461 →
Assignment of Assignor's Interest Nov 25, 2020
From: AHN, JAEIN; KIM, KYUNG HWAN; YUN, SUNGHOON; HEO, HYEYOUNG
To: SKC CO., LTD.
Reel/Frame 054470/0970 →
Assignment of Assignor's Interest Mar 23, 2021
From: SKC CO., LTD.
To: SKC SOLMICS CO., LTD.
Reel/Frame 055685/0677 →
Assignment of Assignor's Interest Aug 11, 2021
From: YUN, JONG WOOK; HEO, HYEYOUNG; AHN, JAEIN; KIM, KYUNG HWAN
To: SKC SOLMICS CO., LTD.
Reel/Frame 057151/0813 →
Assignment of Assignor's Interest Apr 28, 2022
From: YUN, JONG WOOK; JOENG, EUN SUN; SEO, JANGWON; HEO, HYEYOUNG
To: SKC SOLMICS CO., LTD.
Reel/Frame 059767/0418 →
Change of Name Feb 13, 2023
From: SKC SOLMICS CO., LTD.
To: SK ENPULSE CO., LTD.
Reel/Frame 062717/0084 →
Assignment of Assignor's Interest Apr 11, 2023
From: IM, CHANG GYU; SEO, JANGWON; YUN, JONG WOOK; YUN, SUNGHOON
To: SK ENPULSE CO., LTD.
Reel/Frame 063293/0345 →
Assignment of Assignor's Interest Apr 19, 2023
From: YUN, JONG WOOK; SEO, JANG WON; MOON, SU YOUNG; KIM, KYUNG HWAN
To: SK ENPULSE CO., LTD.
Reel/Frame 063368/0185 →
Assignment of Assignor's Interest Jul 31, 2023
From: AN, JOONHO; SEO, JANGWON; IM, CHANG GYU; YUN, JONG WOOK
To: SK ENPULSE CO., LTD.
Reel/Frame 064429/0605 →
Assignment of Assignor's Interest Dec 13, 2023
From: AN, JOONHO; SEO, JANGWON; IM, CHANG GYU; KIM, KYUNG HWAN
To: SK ENPULSE CO., LTD.
Reel/Frame 065861/0267 →
Assignment of Assignor's Interest Jan 16, 2024
From: IM, CHANG GYU; SEO, JANGWON
To: SK ENPULSE CO., LTD.
Reel/Frame 066125/0873 →
Assignment of Assignor's Interest Feb 20, 2024
From: JI, MIN GYEONG; YUN, JONG WOOK; SEO, JANGWON
To: SK ENPULSE CO., LTD.
Reel/Frame 066492/0626 →
Assignment of Assignor's Interest Feb 29, 2024
From: IM, CHANG GYU; SEO, JANG WON; YUN, JONG WOOK; AN, JOON HO
To: SK ENPULSE CO., LTD.
Reel/Frame 066597/0286 →
Assignment of Assignor's Interest Mar 19, 2024
From: YUN, JONG WOOK; SHIN, YUJIN; MOON, SUYOUNG; MIN, EUN GI
To: SK ENPULSE CO., LTD.
Reel/Frame 066823/0811 →
Assignment of Assignor's Interest Jun 13, 2024
From: JI, MINGYEONG; YOON, JONGWOOK; SEO, JANGWON; MOON, SUYOUNG
To: SK ENPULSE CO., LTD.
Reel/Frame 067711/0203 →
Assignment of Assignor's Interest Jun 19, 2024
From: SHIN, YUJIN; YOON, JONGWOOK; SEO, JANGWON; KIM, KYUNGHWAN
To: SK ENPULSE CO., LTD.
Reel/Frame 067765/0495 →
Assignment of Assignor's Interest Aug 26, 2024
From: KIM, YOUNGHWAN; SEO, JANGWON; YOON, JONGWOOK; MIN, EUNGI
To: SK ENPULSE CO., LTD.
Reel/Frame 068392/0541 →
Assignment of Assignor's Interest Aug 28, 2024
From: SHIN, YUJIN; YOON, JONGWOOK; AN, JOONHO; KIM, KYUNGHWAN
To: SK ENPULSE CO., LTD.
Reel/Frame 068419/0247 →
Assignment of Assignor's Interest Sep 12, 2024
From: SHIN, YUJIN; AN, JOONHO; KIM, KYUNGHWAN; SEO, JANGWON
To: SK ENPULSE CO., LTD.
Reel/Frame 068562/0568 →
Assignment of Assignor's Interest Sep 13, 2024
From: KIM, YOUNGHWAN; YOON, JONGWOOK; SEO, JANGWON
To: SK ENPULSE CO., LTD.
Reel/Frame 068575/0966 →