IP Library Assignment 062717/0084
Patent Assignment
Reel/Frame 062717/0084

Change of Name

Recorded: 2023-02-13 Pages: 5
Assignor
SKC SOLMICS CO., LTD.
Executed: 2023-01-01
Assignee
SK ENPULSE CO., LTD.
1043, GYEONGGI-DAERO, PYEONGTAEK-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Properties (31)
Porous Polyurethane Polishing Pad and Preparation Method Thereof
Application: 16/108,607 →
Publication: US 2019/0061097
Porous Polyurethane Polishing Pad and Process for Preparing the Same
Application: 16/311,614 →
Publication: US 2021/0229237
Porous Polishing Pad and Process for Producing the Same
Application: 16/385,653 →
Publication: US 2019/0314954
Porous Polyurethane Polishing Pad and Process for Producing the Same
Application: 16/389,711 →
Publication: US 2019/0321937
Polishing Pad and Method for Producing Same
Application: 16/479,824 →
Publication: US 2021/0354267
Polishing Pad Having Excellent Airtightness
Application: 16/605,483 →
Publication: US 2021/0291314
Polishing Pad Comprising Window Similar in Hardness to Polishing Layer
Application: 16/619,378 →
Publication: US 2020/0164483
Polishing Pad with Improved Crosslinking Density and Process for Preparing the Same
Application: 16/791,881 →
Publication: US 2020/0368873
Polishing Pad, Process for Preparing the Same, and Process for Preparing a Semiconductor Device Using the Same
Application: 17/592,706 →
Publication: US 2022/0152776
Polishing Pad with Adjusted Crosslinking Degree and Process for Preparing the Same
Application: 17/002,386 →
Publication: US 2021/0129284
Composition for Polishing Pad and Polishing Pad
Application: 17/077,360 →
Publication: US 2021/0122007
Polishing Pad, Preparation Method Thereof, and Preparation Method of Semiconductor Device Using Same
Application: 17/104,829 →
Publication: US 2021/0162560
Polishing Pad, Preparation Method Thereof, and Preparation Method of Semiconductor Device Using Same
Application: 17/077,216 →
Publication: US 2021/0138605
Polishing Pad, Preparation Method Thereof, and Preparation Method of Semiconductor Device Using Same
Application: 17/101,363 →
Publication: US 2021/0154797
Polishing Pad, Preparation Method Thereof and Method for Preparing Semiconductor Device Using Same
Application: 17/349,285 →
Publication: US 2021/0394334
Polishing Pad, Preparation Method Thereof and Method for Preparing Semiconductor Device Using Same
Application: 17/349,367 →
Publication: US 2021/0394335
Polishing Pad and Method for Preparing Semiconductor Device Using the Same
Application: 17/399,849 →
Publication: US 2022/0059401
Polishing Pad and Method for Preparing a Semiconductor Device Using the Same
Application: 17/731,410 →
Publication: US 2022/0410337
Porous Polyurethane Polishing Pad and Process for Preparing a Semiconductor Device by Using the Same
Application: 15/989,396 →
Publication: US 2018/0339393
Porous Polyurethane Polishing Pad and Process for Preparing a Semiconductor Device by Using the Same
Application: 15/989,403 →
Publication: US 2018/0339394
Polishing Pad and Method for Preparing Semiconductor Device Using Same
Application: 17/202,977 →
Publication: US 2021/0291315
Leakage-Proof Polishing Pad and Process for Preparing the Same
Application: 16/160,418 →
Publication: US 2019/0111542
Polishing Pad with Improved Fluidity of Slurry and Process for Preparing Same
Application: 16/395,993 →
Publication: US 2019/0389033
Porous Polyurethane Polishing Pad and Method for Manufacturing Same
Application: 16/462,180 →
Publication: US 2019/0329376
Composition for Semiconductor Process and Semiconductor Process
Application: 16/293,476 →
Publication: US 2019/0276740
Composition for a Polishing Pad, Polishing Pad, and Process for Preparing the Same
Application: 16/721,284 →
Publication: US 2020/0207904
Polishing Pad That Minimizes Occurrence of Defects and Process for Preparing the Same
Application: 16/790,388 →
Publication: US 2020/0306921
Composition for Polishing Pad, Polishing Pad and Preparation Method Thereof
Application: 16/726,725 →
Publication: US 2020/0207981
Polishing Pad, Process for Preparing the Same, and Process for Preparing a Semiconductor Device Using the Same
Application: 17/002,427 →
Publication: US 2021/0129285
Polishing Pad, Process for Preparing the Same, and Process for Preparing a Semiconductor Device Using the Same
Application: 17/002,468 →
Publication: US 2021/0122006
Composition for Polishing Pad, Polishing Pad and Preparation Method of Semiconductor Device
Application: 16/899,692 →
Publication: US 2020/0391344
Related Assignments (19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 26, 2018
From: SEO, JANG WON; HAN, HYUK HEE; HEO, HYE YOUNG; RYOU, JOONSUNG
To: SKC CO., LTD.
Reel/Frame 047329/0755 →
Assignment of Assignor's Interest Dec 28, 2018
From: SEO, JANG WON; HAN, HYUK HEE; HEO, HYE YOUNG; RYOU, JOONSUNG
To: SKC CO., LTD.
Reel/Frame 047869/0491 →
Assignment of Assignor's Interest Apr 16, 2019
From: HEO, HYE YOUNG; SEO, JANG WON; YUN, JONG WOOK; YUN, SUNGHOON
To: SKC CO., LTD.
Reel/Frame 048897/0822 →
Assignment of Assignor's Interest Apr 19, 2019
From: HEO, HYE YOUNG; SEO, JANG WON; YUN, JONG WOOK; YUN, SUNGHOON
To: SKC CO., LTD.
Reel/Frame 048942/0303 →
Assignment of Assignor's Interest Jul 22, 2019
From: RYOU, JOONSUNG; KWON, TAE KYOUNG; SEO, JANG WON; YUN, SUNGHOON
To: SKC CO., LTD.
Reel/Frame 049822/0259 →
Assignment of Assignor's Interest Oct 15, 2019
From: YUN, SUNGHOON; SEO, JANG WON; AHN, JAEIN; YUN, JONG WOOK
To: SKC CO., LTD.
Reel/Frame 050722/0769 →
Assignment of Assignor's Interest Dec 4, 2019
From: YUN, SUNGHOON; RYOU, JOONSUNG; SEO, JANG WON; AHN, JAEIN
To: SKC CO., LTD.
Reel/Frame 051179/0338 →
Assignment of Assignor's Interest Feb 14, 2020
From: YUN, JONG WOOK; JOENG, EUN SUN; HEO, HYE YOUNG; SEO, JANG WON
To: SKC CO., LTD.
Reel/Frame 051826/0403 →
Assignment of Assignor's Interest Aug 25, 2020
From: YUN, JONG WOOK; JOENG, EUN SUN; SEO, JANG WON
To: SKC CO., LTD.
Reel/Frame 053592/0985 →
Assignment of Assignor's Interest Oct 22, 2020
From: YUN, JONG WOOK; SEO, JANG WON; HEO, HYEYOUNG; JOENG, EUN SUN
To: SKC CO., LTD.
Reel/Frame 054138/0619 →
Assignment of Assignor's Interest Oct 22, 2020
From: HEO, HYEYOUNG; YUN, JONG WOOK; KYUN, MYUNG-OK; SEO, JANG WON
To: SKC CO., LTD.
Reel/Frame 054137/0456 →
Assignment of Assignor's Interest Nov 23, 2020
From: HEO, HYEYOUNG; YUN, SUNGHOON; SEO, JANG WON; YUN, JONG WOOK
To: SKC CO., LTD.
Reel/Frame 054444/0461 →
Assignment of Assignor's Interest Nov 25, 2020
From: AHN, JAEIN; KIM, KYUNG HWAN; YUN, SUNGHOON; HEO, HYEYOUNG
To: SKC CO., LTD.
Reel/Frame 054470/0970 →
Assignment of Assignor's Interest Mar 23, 2021
From: SKC CO., LTD.
To: SKC SOLMICS CO., LTD.
Reel/Frame 055685/0677 →
Assignment of Assignor's Interest Jun 16, 2021
From: AHN, JAE IN; KIM, KYUNG HWAN; YUN, SUNG HOON; SEO, JANG WON
To: SKC SOLMICS CO., LTD.
Reel/Frame 056565/0227 →
Assignment of Assignor's Interest Jun 16, 2021
From: AHN, JAE IN; KIM, KYUNG HWAN; YUN, SUNG HOON; SEO, JANG WON
To: SKC SOLMICS CO., LTD.
Reel/Frame 056564/0452 →
Assignment of Assignor's Interest Aug 11, 2021
From: YUN, JONG WOOK; HEO, HYEYOUNG; AHN, JAEIN; KIM, KYUNG HWAN
To: SKC SOLMICS CO., LTD.
Reel/Frame 057151/0813 →
Assignment of Assignor's Interest Apr 28, 2022
From: YUN, JONG WOOK; JOENG, EUN SUN; SEO, JANGWON; HEO, HYEYOUNG
To: SKC SOLMICS CO., LTD.
Reel/Frame 059767/0418 →
Assignment of Assignor's Interest Jun 2, 2025
From: SK ENPULSE CO., LTD.
To: ENPULSE CO., LTD.
Reel/Frame 071277/0667 →