Patent Assignment
Reel/Frame 068290/0833
Change of Name
Recorded: 2024-06-27
Pages: 4
Assignor
JX METALS CORPORATION
Executed: 2024-05-14
Assignee
JX ADVANCED METALS CORPORATION
10-4, TORANOMON 2-CHOME, MINATO-KU, TOKYO, 105-8417, JAPAN
Covered Property
(1)
Sputtering Target, Manufacturing Method Therefor, And Manufacturing Method For Magnetic Recording Medium
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.