Patent Assignment
Reel/Frame 069387/0453
Assignment of Assignor's Interest
Recorded: 2024-11-23
Pages: 14
Assignor
ASM GENITECH KOREA LTD.
Executed: 2011-12-30
Assignee
ASM IP HOLDING B.V.
VERSTERKERSTRAAT 8, ALMERE, 1322 AP, NETHERLANDS
Covered Properties
(5)
Method of Forming Semiconductor Patterns
Deposition Apparatus
Plasma Processing Member, Deposition Apparatus Including the Same, and Depositing Method Using the Same
Method of Depositing Silicon Oxide Films
Method of Depositing Silicon Oxide Films
Related Assignments
(6)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Apr 13, 2011
From: BEYNET, JULIEN; PARK, HYUNG SANG; INOUE, NAOKI
To: ASM GENITECH KOREA LTD.
Reel/Frame 026113/0245 →
Change of Name
Mar 21, 2019
From: ASM GENITECH KOREA, LTD.
To: ASM KOREA LTD.
Reel/Frame 048658/0249 →
Assignment of Assignor's Interest
Mar 3, 2021
From: YOON, TAE HO; PARK, HYUNG SANG; YOO, YONG MIN
To: ASM GENITECH KOREA LTD.
Reel/Frame 055481/0701 →
Change of Name
Mar 3, 2021
From: ASM GENITECH KOREA LTD.
To: ASM KOREA LTD.
Reel/Frame 055481/0809 →
Assignment of Assignor's Interest
Feb 1, 2022
From: YOON, TAE HO; PARK, HYUNG SANG; YOO, YONG MIN
To: ASM GENITECH KOREA LTD.
Reel/Frame 058850/0882 →
Change of Name
Feb 1, 2022
From: ASM GENITECH KOREA LTD.
To: ASM KOREA LTD.
Reel/Frame 058850/0905 →