IP Library Assignment 074344/0157
Patent Assignment
Reel/Frame 074344/0157

Nunc Pro Tunc Assignment

Recorded: 2026-04-12 Received: 2026-04-12 Pages: 4
Assignor
HONEYWELL INTERNATIONAL INC.
Executed: 2026-03-24
Assignee
SOLSTICE ADVANCED MATERIALS US, INC.
115 TABOR ROAD, MORRIS PLAINS, NJ, 07950, UNITED STATES
Covered Properties (20)
Low Thermal Impedance Phase Change Thermal Interface Materials
Application: 19/270,182 →
Highly Thermally Conductive Hybrid Thermal Interface Material
Application: 18/741,727 →
Low Melt Point Metal Based Thermal Interface Material
Application: 18/523,255 →
Gel-Type Thermal Interface Material with Low Pre-Curing Viscosity and Elastic Properties Post-Curing
Application: 16/844,916 →
Stab and Ballistic Resistant Articles and the Process of Making
Application: 16/377,332 →
Novel Uhmwpe Fiber and Method to Produce
Application: 15/897,585 →
Thermal Interface Material with Ion Scavenger
Application: 15/322,691 →
Compressible Thermal Interface Materials
Application: 15/117,862 →
Thermal Interface Material and Method of Making and Using the Same
Application: 15/140,173 →
Isotope Displacement Refining Process for Producing Low Alpha Materials
Application: 14/751,264 →
Metal Refining Process Using Mixed Electrolyte
Application: 14/185,341 →
High Tenacity High Modulus Uhmwpe Fiber and the Process of Making
Application: 13/766,112 →
High Performance Ballistic Composites and Method of Making
Application: 13/602,371 →
High molecular weight poly(alpha-olefin) solutions and articles made therefrom
Application: 12/925,873 →
Process for the Preparation of Uhmw Multi-Filament Poly(Alpha-Olefin) Yarns
Application: 12/914,182 →
Functional Nano-Layered Hemostatic Material/Device
Application: 12/125,096 →
Adsorbent-Containing Hemostatic Devices
Application: 11/937,527 →
Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
Application: 11/838,854 →
Coating Composition Optimization for via Fill and Photolithography Applications and Methods of Preparation Thereof
Application: 10/567,420 →
Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof
Application: 10/495,686 →