IP Library Granted Patent US 7,391,200
Granted Patent B1
US 7,391,200 · App. 11/670,924 · Granted Jun 24, 2008

P-channel power chip

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Quick Facts
Patent No.
US 7,391,200
App. No.
11/670,924
Filed
Feb 2, 2007
Granted
Jun 24, 2008
Kind
B1
Examiner
PERT, EVAN T
Art Unit
2826
USPC
323/349
Abstract

An integrated circuit device for delivering power to a load includes a P-MOS power transistor, an N-MOS bypass transistor and a gate driver circuit. The P-MOS power transistor is coupled between a supply voltage node and a power output node of the integrated circuit device, and the N-MOS bypass transistor is coupled between the power output node and a reference node of the integrated circuit device. The gate driver circuit responds to a pulse-width-modulated (PWM) control signal by outputting an active-low drive-enable signal to a gate terminal of the P-MOS power transistor and an active-high bypass-enable signal to a gate terminal of the N-MOS bypass transistor during respective, non-overlapping intervals.

Claims (31)

1. An integrated circuit device for delivering power to a load, the integrated circuit device comprising:

a P-type metal oxide semiconductor (P-MOS) power transistor coupled between a supply voltage node and a power output node of the integrated circuit device;

an N-type metal oxide semiconductor (N-MOS) bypass transistor coupled between the power output node and a reference node of the integrated circuit device; and

a gate driver circuit to receive a pulse-width-modulated (PWM) control signal and to output, in response to the PWM control signal, an active-low drive-enable signal to a gate terminal of the P-MOS power transistor and an active-high bypass-enable signal to a gate terminal of the N-MOS bypass transistor during respective, non-overlapping intervals.

2. The integrated circuit device of claim 1 wherein the P-MOS power transistor comprises a negatively-doped well disposed within a semiconductor substrate of the integrated circuit device, and the N-MOS bypass transistor comprises a negatively-doped drain node that is separated from the negatively-doped well by at least fifty (50) microns (μm).

3. The integrated circuit device of claim 1 wherein the P-MOS power transistor comprises a negatively-doped well disposed within a semiconductor substrate of the integrated circuit device and wherein the integrated circuit device further comprises a guard ring coupled to the reference node and disposed between the negatively-doped well and the semiconductor substrate to reduce resistance between a negatively-doped terminal, disposed within the negatively-doped well, and the ground reference node.

4. The integrated circuit device of claim 1 wherein the gate driver circuit includes control circuitry to lower the drive-enable signal for an interval indicated by the width of a pulse within the PWM control signal, and then to raise the drive-enable signal prior to outputting the active-high bypass-enable signal.

5. The integrated circuit device of claim 1 wherein the gate driver circuit includes control circuitry to lower the drive-enable signal in response to a leading edge of a pulse within the PWM control signal, maintain the drive-enable signal in a logic low state for the duration of the pulse, and raise the drive-enable signal at a trailing edge of the pulse.

6. The integrated circuit device of claim 5 wherein the leading edge of the pulse is a rising edge, and the trailing edge of the pulse is a falling edge.

7. The integrated circuit device of claim 1 wherein the gate driver circuitry comprises control circuitry to raise the active-high bypass-enable signal for a predetermined interval following detection of a pulse in the PWM control signal.

8. The integrated circuit device of claim 1 wherein the gate driver circuitry comprises control circuitry to raise the active-high bypass-enable signal for a predetermined interval following the trailing edge of a pulse in the PWM control signal.

9. The integrated circuit device of claim 1 wherein the gate driver circuitry comprises control circuitry to raise the active-high bypass-enable signal for a duration determined, at least in part, by the PWM control signal.

10. A method of operation within an integrated circuit device, the method comprising:

receiving a pulse-width-modulated (PWM) control signal; and

switching a P-type metal oxide semiconductor (P-MOS) power transistor to a conductive state for the duration of a pulse within the PWM control signal to switchably couple a power supply node to an output of the integrated circuit device.

11. The method of claim 10 further comprising:

switching the P-MOS power transistor to a substantially non-conductive state at the conclusion of the pulse within the PWM control signal; and

switching an N-type metal oxide semiconductor (N-MOS) bypass transistor to a conductive state after switching the P-MOS power transistor to the substantially non-conductive state.

12. The method of claim 11 wherein switching the N-MOS bypass transistor to the conductive state after switching the P-MOS power transistor to the substantially non-conductive state comprises delaying for a dead time interval after raising a drive-enable signal that is supplied to a gate of the P-MOS power transistor and prior to raising a bypass signal that is supplied to a gate terminal of the N-MOS bypass transistor.

13. The method of claim 10 wherein switching the P-MOS power transistor to a conductive state for the duration of a pulse within the PWM control signal comprises lowering a drive-enable signal in response to a leading edge of the pulse within the PWM control signal, and then raising the drive-enable signal in response to a trailing edge of the pulse within the PWM control signal, the drive-enable signal being supplied to a gate terminal of the P-MOS power transistor.

14. An integrated circuit device for delivering power to a load, the integrated circuit device comprising:

means for receiving a pulse-width-modulated (PWM) control signal; and

means for switching a P-type metal oxide semiconductor (P-MOS) power transistor to a conductive state for the duration of a pulse within the PWM control signal to switchably couple a power supply node to an output of the integrated circuit device.

15. The integrated circuit device of claim 14 further comprising:

means for switching the P-MOS power transistor to a substantially non-conductive state at the conclusion of the pulse within the PWM control signal; and

means for switching an N-type metal oxide semiconductor (N-MOS) bypass transistor to a conductive state after switching the P-MOS power transistor to the substantially non-conductive state.

16. The method of claim 14 wherein the means for switching the P-MOS power transistor to a conductive state for the duration of a pulse within the PWM control signal comprises means for lowering a drive-enable signal in response to a leading edge of the pulse within the PWM control signal, and then raising the drive-enable signal in response to a trailing edge of the pulse within the PWM control signal, the drive-enable signal being supplied to a gate terminal of the P-MOS power transistor.

17. Computer-readable media having information embodied therein that includes a description of an integrated circuit device for delivering power to a load, the information including descriptions of:

a P-type metal oxide semiconductor (P-MOS) power transistor coupled between a supply voltage node and a power output node of the integrated circuit device;

an N-type metal oxide semiconductor (N-MOS) bypass transistor coupled between the power output node and a reference node of the integrated circuit device; and

a gate driver circuit to receive a pulse-width-modulated (PWM) control signal and to output, in response to the PWM control signal, an active-low drive-enable signal to a gate terminal of the P-MOS power transistor and an active-high bypass-enable signal to a gate terminal of the N-MOS bypass transistor during respective, non-overlapping intervals.

Assignments (11)
CORRECTIVE ASSIGNMENT TO CORRECT THE ERROR IN RECORDING THE MERGER PREVIOUSLY RECORDED AT REEL: 047357 FRAME: 0302. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Mar 22, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 048674/0834 →
CORRECTIVE ASSIGNMENT TO CORRECT THE EFFECTIVE DATE OF MERGER PREVIOUSLY RECORDED ON REEL 047195 FRAME 0658. ASSIGNOR(S) HEREBY CONFIRMS THE THE EFFECTIVE DATE IS 09/05/2018. Recorded Oct 29, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047357/0302 →
MERGER Recorded Oct 4, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047195/0658 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: BROADCOM CORPORATION
Reel/Frame 041712/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 1, 2017
From: BROADCOM CORPORATION
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041706/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: BROADCOM CORPORATION
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037806/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 16, 2015
From: NETLOGIC I LLC
To: BROADCOM CORPORATION
Reel/Frame 035443/0763 →
CHANGE OF NAME Recorded Apr 16, 2015
From: NETLOGIC MICROSYSTEMS, INC.
To: NETLOGIC I LLC
Reel/Frame 035443/0824 →
RELEASE OF SECURITY INTEREST Recorded Aug 30, 2011
From: SILICON VALLEY BANK
To: NETLOGIC MICROSYSTEMS, INC.; NETLOGIC MICROSYSTEMS INTERNATIONAL LIMITED; NETLOGIC MICROSYSTEMS CAYMANS LIMITED
Reel/Frame 026830/0141 →
SECURITY AGREEMENT Recorded Jul 17, 2009
From: NETLOGIC MICROSYSTEMS, INC.; NETLOGIC MICROSYSTEMS INTERNATIONAL LIMITED; NETLOGIC MICROSYSTEMS CAYMANS LIMITED
To: SILICON VALLEY BANK
Reel/Frame 022973/0710 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 2, 2007
From: KHANNA, SANDEEP; SRINIVASAN, VARADARAJAN
To: NETLOGIC MICROSYSTEMS, INC.
Reel/Frame 018849/0191 →