IP Library › Granted Patent US 6,537,708
Granted Patent Utility
US 6,537,708 · Confirmation No. 5390

ELECTRICAL CRITICAL DIMENSION MEASUREMENTS ON PHOTOMASKS

Inventor: David Y. Chan
Patented Case View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2001-01-31 TRNA Transmittal of New Application 2 View
2001-01-31 SPEC Specification 9 View
2001-01-31 CLM Claims 4 View
2001-01-31 ABST Abstract 1 View
2001-01-31 DRW Drawings-only black and white line drawings 4 View
2001-01-31 OATH Oath or Declaration filed 2 View
2001-01-31 LET. Miscellaneous Incoming Letter 1 View
2001-01-31 TRNA Transmittal of New Application 2 View
2001-01-31 SPEC Specification 9 View
2001-01-31 CLM Claims 4 View
2001-01-31 ABST Abstract 1 View
2001-01-31 DRW Drawings-only black and white line drawings 4 View
2001-01-31 OATH Oath or Declaration filed 2 View
2001-01-31 LET. Miscellaneous Incoming Letter 1 View
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Quick Facts
Patent No.
US 6,537,708
App. No.
09/773,122
Filed
2001-01-31
Granted
2003-03-25
Pub. No.
US20020102472A1
Art Unit
1756
PTA
0 days