Patent Assignment
Reel/Frame 047002/0633
Security Interest
Recorded: 2018-09-28
Pages: 11
Assignor
PHOTRONICS, INC.
Executed: 2018-09-27
Assignee
JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
IL1-1145/54/63, P.O. BOX 6026, CHICAGO, ILLINOIS, 60680-6026
Covered Properties
(42)
Method for Fabricating Continuous Space Variant Attenuating Lithography Mask for Fabrication of Devices with Three-Dimensional Structures and Microelectronics
Method of Manufacturing Photomasks by Plasma Etching with Resist Stripped
Patent:
6,406,818 →
Application:
09/283,087 →
Use of Intersecting Subresolution Features for Microlithography
Patent:
6,139,994 →
Application:
09/344,251 →
Disposable Hard Mask for Photomask Plasma Etching
Patent:
6,472,107 →
Application:
09/409,454 →
Step Mask
Fused Silica Pellicle
Electrical Critical Dimension Measurements on Photomasks
Method for Fabricating Chirped Fiber Bragg Gratings
Automated Manufacturing System and Method for Processing Photomasks
Method of Manufacturing Photomasks by Plasma Etching with Resist Stripped
Rule Based System and Method for Automatically Generating Photomask Orders in a Specified Order Format
Photomask Having an Intermediate Inspection Film Layer
Disposable Hard Mask for Photomask Plasma Etching
Fused Silica Pellicle
Binary Half Tone Photomasks and Microscopic Three-Dimensional Devices and Method of Fabricating the Same
Method for Fabricating Chirped Fiber Bragg Gratings
Disposable Hard Mask for Phase Shift Photomask Plasma Etching
Alternating Aperture Phase Shift Photomask Having Light Absorption Layer
Photomask Having an Internal Substantially Transparent Etch Stop Layer
Fused Silica Pellicle in Intimate Contact with the Surface of a Photomask
Embedded Attenuated Phase Shift Mask with Tunable Transmission
Disposable Hard Mask for Photomask Plasma Etching
Automated Manufacturing System and Method for Processing Photomasks
Photomask Reticle Having Multiple Versions of the Same Mask Pattern with Different Biases
Rule Based System and Method for Automatically Generating Photomask Orders by Conditioning Information from a Customer's Computer System
Method of Forming a Semiconductor Layer Using a Photomask Reticle Having Multiple Versions of the Same Mask Pattern with Different Biases
Binary Half Tone Photomasks and Microscopic Three-Dimensional Devices and Method of Fabricating the Same
User-Friendly Rule-Based System and Method for Automatically Generating Photomask Orders
Alternating Aperture Phase Shift Photomask Having Light Absorption Layer
Comprehensive Front End Method and System for Automatically Generating and Processing Photomask Orders
Automated Manufacturing System and Method for Processing Photomasks
Binary Half Tone Photomasks and Microscopic Three-Dimensional Devices and Method of Fabricating the Same
Photomask with Detector for Optimizing an Integrated Circuit Production Process and Method of Manufacturing an Integrated Circuit Using the Same
Secure Photomask with Blocking Aperture
Photomask with Detector for Optimizing an Integrated Circuit Production Process and Method of Manufacturing an Integrated Circuit Using the Same
Security Element for an Integrated Circuit, Integrated Circuit Including the Same, and Method for Securing an Integrated Circuit
Photomask Having A Reduced Field Size And Method Of Using The Same
Photomask with Detector for Optimizing an Integrated Cirucit Production Process and Method of Manufacturing an Integrated Circuit Using the Same
Photomask Having a Reduced Field Size and Method of Using the Same
Microfluidic Thermoptic Energy Processor
Microfluidic Thermoptic Energy Processor
Pellicle Removal Tool