Granted Patent
Utility
US 6,682,861
· Confirmation No. 9818
DISPOSABLE HARD MASK FOR PHASE SHIFT PHOTOMASK PLASMA ETCHING
Inventor:
David Y. Chan
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⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2003-11-24 | IFEE |
Issue Fee Payment (PTO-85B) | 2 | View | |
| 2003-02-19 | TRNA |
Transmittal of New Application | 4 | View | |
| 2003-02-19 | SPEC |
Specification | 20 | View | |
| 2003-02-19 | CLM |
Claims | 10 | View | |
| 2003-02-19 | ABST |
Abstract | 1 | View | |
| 2003-02-19 | DRW |
Drawings-only black and white line drawings | 10 | View | |
| 2003-02-19 | OATH |
Oath or Declaration filed | 3 | View |
Inventors
David Y. Chan
Austin, TX
Classification
USPC
430/5
G03F1/80
G03F1/30
G03F7/094
Prosecution
- Examiner
- MOHAMEDULLA, SALEHA R
- Art Unit
- 1756
- Docket No.
- 67493/51
- Confirmation No.
- 9818
Publication
- Pub. No.
- US20030186137A1
- Pub. Date
- 2003-10-02
Patent Term Adjustment
0days
from
PHOTRONICS, INC.
SECURITY INTEREST
Recorded 2018-09-28
from
PHOTRONICS, INC.
SECURITY AGREEMENT
Recorded 2010-02-13
from
PHOTRONICS, INC.
SECURITY AGREEMENT
Recorded 2008-12-19
from
PHOTRONICS, INC.
SECURITY AGREEMENT
Recorded 2008-12-15
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Quick Facts
- Patent No.
- US 6,682,861
- App. No.
- 10/370,408
- Filed
- 2003-02-19
- Granted
- 2004-01-27
- Pub. No.
- US20030186137A1
- Examiner
- MOHAMEDULLA, SALEHA R
- Art Unit
- 1756
- PTA
- 0 days
External Links