Patent Assignment
Reel/Frame 023928/0612
Security Agreement
Recorded: 2010-02-13
Received: 2010-02-13
Pages: 9
Assignor
PHOTRONICS, INC.
Executed: 2010-02-12
Assignee
JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
10 SOUTH DEARBORN, CHICAGO, IL, 60603, UNITED STATES
Covered Properties
(52)
Photomask Having A Reduced Field Size And Method Of Using The Same
Application:
12/486,564 →
Secure Photomask with Blocking Aperture
Application:
12/105,992 →
Security Element for an Integrated Circuit, Integrated Circuit Including the Same, and Method for Securing an Integrated Circuit
Application:
12/106,033 →
Photomask with Detector for Optimizing an Integrated Circuit Production Process and Method of Manufacturing an Integrated Circuit Using the Same
Application:
12/106,014 →
Foldable Prostheses, Multiple Component Prosthetic Heart Valve Assemblies, and Apparatus and Methods for Delivering Them
Application:
11/742,424 →
Photomask with Detector for Optimizing an Integrated Circuit Production Process and Method of Manufacturing an Integrated Circuit Using the Same
Application:
11/788,473 →
Binary Half Tone Photomasks and Microscopic Three-Dimensional Devices and Method of Fabricating the Same
Application:
11/439,757 →
Automated Manufacturing System and Method for Processing Photomasks
Application:
11/177,459 →
System and method for automatically generating and/or processing a photomask order using a script profiler
Application:
11/139,741 →
Comprehensive Front End Method and System for Automatically Generating and Processing Photomask Orders
Application:
11/140,004 →
Alternating Aperture Phase Shift Photomask Having Light Absorption Layer
Application:
11/024,268 →
System and method for automatically generating a tooling specification using a logical operations utility that can be used to generate a photomask order
Application:
11/006,525 →
User-Friendly Rule-Based System and Method for Automatically Generating Photomask Orders
Application:
10/981,201 →
Binary Half Tone Photomasks and Microscopic Three-Dimensional Devices and Method of Fabricating the Same
Application:
10/975,293 →
Method of repairing a photomask having an internal etch stop layer
Application:
10/936,071 →
Method of Forming a Semiconductor Layer Using a Photomask Reticle Having Multiple Versions of the Same Mask Pattern with Different Biases
Application:
10/920,475 →
Rule Based System and Method for Automatically Generating Photomask Orders by Conditioning Information from a Customer's Computer System
Application:
10/877,001 →
Photomask Reticle Having Multiple Versions of the Same Mask Pattern with Different Biases
Application:
10/866,976 →
Automated Manufacturing System and Method for Processing Photomasks
Application:
10/852,532 →
Disposable Hard Mask for Photomask Plasma Etching
Application:
10/839,025 →
Embedded Attenuated Phase Shift Mask with Tunable Transmission
Application:
10/803,847 →
Fused Silica Pellicle in Intimate Contact with the Surface of a Photomask
Application:
10/733,723 →
Photomask Having an Internal Substantially Transparent Etch Stop Layer
Application:
10/658,039 →
Alternating Aperture Phase Shift Photomask Having Light Absorption Layer
Application:
10/391,001 →
Method for Fabricating Chirped Fiber Bragg Gratings
Application:
10/369,262 →
Disposable Hard Mask for Phase Shift Photomask Plasma Etching
Application:
10/370,408 →
Binary Half Tone Photomasks and Microscopic Three-Dimensional Devices and Method of Fabricating the Same
Application:
10/349,629 →
Fused Silica Pellicle
Application:
10/322,858 →
Portion of Container
Application:
29/170,580 →
Portion of Container
Application:
29/170,644 →
Portion of Container
Application:
29/170,581 →
Portion of Container
Application:
29/169,608 →
Disposable Hard Mask for Photomask Plasma Etching
Application:
10/234,790 →
Photomask Having an Intermediate Inspection Film Layer
Application:
10/229,830 →
Rule Based System and Method for Automatically Generating Photomask Orders in a Specified Order Format
Application:
10/209,254 →
Container Having Expandable Neck
Application:
10/183,183 →
Hot-Fillable Container with Grip
Application:
10/163,020 →
Grippable Bottle
Application:
29/160,460 →
Method of Manufacturing Photomasks by Plasma Etching with Resist Stripped
Application:
10/136,251 →
Multi-Chambered Container Production Process
Application:
10/105,534 →
Automated Manufacturing System and Method for Processing Photomasks
Application:
10/099,622 →
Method and Apparatus for Making Photomasks with Improved Inside Corner Resolution
Application:
09/989,807 →
Manifold Structure for Pressure Molding
Application:
09/977,825 →
Beverage Bottle with Hand Grip
Application:
29/148,714 →
Container Base
Application:
29/148,228 →
Base for Plastic Container
Application:
09/953,772 →
Method for Fabricating Chirped Fiber Bragg Gratings
Application:
09/940,947 →
Beverage Bottle
Application:
29/144,391 →
Grippable Beverage Bottle
Application:
29/144,367 →
Electrical Critical Dimension Measurements on Photomasks
Application:
09/773,122 →
Fused Silica Pellicle
Application:
09/766,907 →
Step Mask
Application:
09/755,438 →