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App. No. 09/775,713 · Confirmation No. 7914

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING A STEP OF FORMING A SILICIDE LAYER, AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY

Inventor: Tamotsu Ogata
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
⬇ PDF
 Code Description Pages PDF
2001-02-05 TRNA Transmittal of New Application 2 View
2001-02-05 SPEC Specification 11 View
2001-02-05 CLM Claims 2 View
2001-02-05 ABST Abstract 1 View
2001-02-05 DRW Drawings-only black and white line drawings 5 View
2001-02-05 OATH Oath or Declaration filed 3 View
2001-02-05 TRNA Transmittal of New Application 2 View
2001-02-05 SPEC Specification 11 View
2001-02-05 CLM Claims 2 View
2001-02-05 ABST Abstract 1 View
2001-02-05 DRW Drawings-only black and white line drawings 5 View
2001-02-05 OATH Oath or Declaration filed 3 View
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Quick Facts
App. No.
09/775,713
Filed
2001-02-05
Granted
2003-07-29
Pub. No.
US20020019090A1
Art Unit
2823
PTA
-1 days