IP Library › Granted Patent US 6,376,309
Granted Patent Utility
US 6,376,309 · Confirmation No. 8022

Method for reduced gate aspect ratio to improve gap-fill after spacer etch

Patented Case View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2001-03-16 TRNA Transmittal of New Application 2 View
2001-03-16 A.PE Preliminary Amendment 6 View
2001-03-16 SPEC Specification 15 View
2001-03-16 CLM Claims 4 View
2001-03-16 ABST Abstract 1 View
2001-03-16 DRW Drawings-only black and white line drawings 7 View
2001-03-16 OATH Oath or Declaration filed 2 View
2001-03-16 TRNA Transmittal of New Application 2 View
2001-03-16 A.PE Preliminary Amendment 6 View
2001-03-16 SPEC Specification 15 View
2001-03-16 CLM Claims 4 View
2001-03-16 ABST Abstract 1 View
2001-03-16 DRW Drawings-only black and white line drawings 7 View
2001-03-16 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,376,309
App. No.
09/811,288
Filed
2001-03-16
Granted
2002-04-23
Pub. No.
US20010016386A1
Art Unit
2823
PTA
-98 days