IP Library › Granted Patent US 6,703,624
Granted Patent Utility
US 6,703,624 · Confirmation No. 1847

MULTI-BEAM EXPOSURE APPARATUS USING A MULTI-AXIS ELECTRON LENS, ELECTRON LENS CONVERGENCING A PLURALITY OF ELECTRON BEAM AND FABRICATION METHOD OF A SEMICONDUCTOR DEVICE

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2004-01-05 IFEE Issue Fee Payment (PTO-85B) 1 View
2001-04-04 TRNA Transmittal of New Application 2 View
2001-04-04 SPEC Specification 86 View
2001-04-04 CLM Claims 5 View
2001-04-04 ABST Abstract 1 View
2001-04-04 DRW Drawings-only black and white line drawings 55 View
2001-04-04 OATH Oath or Declaration filed 6 View
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Quick Facts
Patent No.
US 6,703,624
App. No.
09/824,874
Filed
2001-04-04
Granted
2004-03-09
Pub. No.
US20010028042A1
Art Unit
2881
PTA
0 days