IP Library › Granted Patent US 6,787,780
Granted Patent Utility
US 6,787,780 · Confirmation No. 3364

MULTI-BEAM EXPOSURE APPARATUS USING A MULTI-AXIS ELECTRON LENS, FABRICATION METHOD OF A SEMICONDUCTOR DEVICE

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2004-05-05 IFEE Issue Fee Payment (PTO-85B) 1 View
2004-04-26 FRPR Certified Copy of Foreign Priority Application 87 View
2003-07-21 RCEX Request for Continued Examination (RCE) 1 View
2003-07-21 CFILE Request for Corrected Filing Receipt 4 View
2003-07-21 LET. Miscellaneous Incoming Letter 3 View
2003-07-21 ADS Application Data Sheet 3 View
2003-07-21 OATH Oath or Declaration filed 3 View
2003-07-21 IDS Information Disclosure Statement (IDS) Form (SB08) 4 View
2001-04-04 TRNA Transmittal of New Application 2 View
2001-04-04 SPEC Specification 86 View
2001-04-04 CLM Claims 5 View
2001-04-04 ABST Abstract 1 View
2001-04-04 DRW Drawings-only black and white line drawings 55 View
2001-04-04 OATH Oath or Declaration filed 6 View
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Quick Facts
Patent No.
US 6,787,780
App. No.
09/824,880
Filed
2001-04-04
Granted
2004-09-07
Pub. No.
US20010028046A1
Art Unit
2881
PTA
-120 days