Granted Patent
Utility
US 6,579,372
· Confirmation No. 6814
APPARATUS AND METHOD FOR DEPOSITING THIN FILM ON WAFER USING ATOMIC LAYER DEPOSITION
Inventor:
Young-Hoon Park
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⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2014-09-02 | IMIS |
Miscellaneous Internal Document | 1 | View | |
| 2001-05-03 | TRNA |
Transmittal of New Application | 4 | View | |
| 2001-05-03 | A.PE |
Preliminary Amendment | 17 | View | |
| 2001-05-03 | SPEC |
Specification | 17 | View | |
| 2001-05-03 | CLM |
Claims | 7 | View | |
| 2001-05-03 | ABST |
Abstract | 1 | View | |
| 2001-05-03 | DRW |
Drawings-only black and white line drawings | 8 | View | |
| 2001-05-03 | OATH |
Oath or Declaration filed | 4 | View |
Inventors
Young-Hoon Park
Kyungki-do, KOREA, REPUBLIC OF
Attorneys & Agents of Record
Classification
USPC
118/715
C23C16/45544
Y10T137/4673
C23C16/45548
C23C16/45561
C23C16/45565
C23C16/45574
Y10S438/935
Prosecution
- Examiner
- LUND, JEFFRIE ROBERT
- Art Unit
- 1763
- Docket No.
- YPL-0018
- Confirmation No.
- 6814
Foreign Priority
00-35100
·
2000-06-24
·
REPUBLIC OF KOREA
Publication
- Pub. No.
- US20020052097A1
- Pub. Date
- 2002-05-02
Patent Term Adjustment
-5days
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Quick Facts
- Patent No.
- US 6,579,372
- App. No.
- 09/848,579
- Filed
- 2001-05-03
- Granted
- 2003-06-17
- Pub. No.
- US20020052097A1
- Examiner
- LUND, JEFFRIE ROBERT
- Art Unit
- 1763
- PTA
- -5 days
External Links