Granted Patent
Utility
US 6,603,120
· Confirmation No. 8097
TEST METHOD OF MASK FOR ELECTRON-BEAM EXPOSURE AND METHOD OF ELECTRON-BEAM EXPOSURE
Inventor:
Hiroshi Yamashita
|
⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-05-30 | TRNA |
Transmittal of New Application | 2 | View | |
| 2001-05-30 | A.PE |
Preliminary Amendment | 5 | View | |
| 2001-05-30 | SPEC |
Specification | 35 | View | |
| 2001-05-30 | CLM |
Claims | 8 | View | |
| 2001-05-30 | ABST |
Abstract | 1 | View | |
| 2001-05-30 | DRW |
Drawings-only black and white line drawings | 8 | View | |
| 2001-05-30 | OATH |
Oath or Declaration filed | 1 | View |
Inventors
Hiroshi Yamashita
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
250/307
H10P76/00
B82Y10/00
G03F1/20
B82Y40/00
G03F1/86
H01J37/3174
H01J2237/31791
H01J2237/31794
Prosecution
- Examiner
- BERMAN, JACK I
- Art Unit
- 2881
- Customer No.
- 26304
- Docket No.
- NECW 18.696
- Confirmation No.
- 8097
Foreign Priority
2000-183295
·
2000-06-19
·
JAPAN
Publication
- Pub. No.
- US20010054697A1
- Pub. Date
- 2001-12-27
Patent Term Adjustment
-111days
No related applications found.
CHANGE OF ADDRESS
Recorded 2017-11-29
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-19
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Quick Facts
- Patent No.
- US 6,603,120
- App. No.
- 09/870,219
- Filed
- 2001-05-30
- Granted
- 2003-08-05
- Pub. No.
- US20010054697A1
- Examiner
- BERMAN, JACK I
- Art Unit
- 2881
- PTA
- -111 days
External Links