IP Library › Granted Patent US 6,809,039
Granted Patent Utility
US 6,809,039 · Confirmation No. 6115

METHOD FOR FORMING A SILICIDE LAYER

Inventor: Takamasa Ito
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2003-12-24 CTNF Non-Final Rejection 5 View
2003-12-24 892 List of references cited by examiner 1 View
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2003-07-16 CTFR Final Rejection 7 View
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2003-04-28 SPEC Specification 3 View
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2003-04-28 REM Applicant Arguments/Remarks Made in an Amendment 10 View
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2003-01-29 CTNF Non-Final Rejection 5 View
2003-01-29 892 List of references cited by examiner 1 View
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2003-01-16 SRNT Examiner's search strategy and results 1 View
2001-08-27 TRNA Transmittal of New Application 2 View
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2001-08-27 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2001-08-27 SRFW Search information including classification, databases and other search related notes 1 View
2001-08-27 FWCLM Index of Claims 1 View
2001-08-27 TRNA Transmittal of New Application 2 View
2001-08-27 DRW Drawings-only black and white line drawings 5 View
2001-08-27 SPEC Specification 8 View
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Quick Facts
Patent No.
US 6,809,039
App. No.
09/940,247
Filed
2001-08-27
Granted
2004-10-26
Pub. No.
US20020031915A1
Examiner
VINH, LAN
Art Unit
1765
PTA
-83 days