Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
View Patent ↗A semiconductor wafer processing system including a multi-chamber module having vertically-stacked semiconductor wafer process chambers and a loadlock chamber dedicated to each semiconductor wafer process chamber. Each process chamber includes a chuck for holding a wafer during wafer processing. The multi-chamber modules may be oriented in a linear array. The system further includes an apparatus having a dual-wafer single-axis transfer arm including a monolithic arm pivotally mounted within said loadlock chamber about a single pivot axis. The apparatus is adapted to carry two wafers, one unprocessed and one processed, simultaneously between the loadlock chamber and the process chamber. A method utilizing the disclosed system is also provided.
1. A semiconductor wafer process apparatus comprising:
a dual-wafer single-axis transfer arm adapted to carry and transfer semiconductor wafers between a loadlock chamber and a semiconductor wafer process chamber, said transfer arm having a monolithic arm pivotally mounted within said loadlock chamber about a single pivot axis;
wherein said transfer arm is adapted to carry at least two wafers simultaneously between said loadlock chamber and said process chamber; and
wherein said transfer arm comprises a retracted home position and an extended position in which said transfer arm extends into said process chamber, wherein said single pivot axis allows said transfer arm to pivot between said retracted and extended positions.
2. The semiconductor wafer process apparatus according to claim 1 further comprising a cooling plate disposed below said transfer arm when said pivot arm is in said retracted position.
3. The semiconductor wafer process apparatus according to claim 2 wherein said cooling plate further comprises a plurality of lift pins for transporting the wafers between said cooling plate and said transfer arm.
4. The semiconductor wafer process apparatus according to claim 1 wherein the transfer arm comprises an end effector, said effector comprising an upper shelf and a lower shelf with wafer edge supports thereon respectively and being coupled to the monolithic transfer arm, said effector pivoting with the monolithic arm about said pivot axis.
5. A semiconductor wafer process apparatus according to claim 1 wherein said transfer arm further comprises a lower wafer shelf for carrying a processed wafer and an upper wafer shelf for carrying an unprocessed wafer.
6. A semiconductor wafer processing apparatus according to claim 1 wherein said transfer arm is adopted to simultaneously carry one unprocessed wafer and one processed wafer.