IP Library › Patent Application 10040490
Patent Application Utility
App. No. 10/040,490 · Confirmation No. 2854

METHOD FOR MINIMIZING VARIATION IN ETCH RATE OF SEMICONDUCTOR WAFER CAUSED BY VARIATION IN MASK PATTERN DENSITY

Inventor: Kye Hyun Baek
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
⬇ PDF
 Code Description Pages PDF
2015-06-09 MFEE.C.AD Maintenance Fee Address Change 2 View
2015-06-09 N417 Electronic Filing System Acknowledgment Receipt 2 View
2010-02-24 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2010-02-24 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2010-02-04 PA.. Power of Attorney 2 View
2010-02-04 N417 Electronic Filing System Acknowledgment Receipt 2 View
2010-02-04 R3.73 Assignee showing of ownership per 37 CFR 3.73 2 View
2009-10-07 N570 Communication - Re: Power of Attorney (PTOL-308) 1 View
2009-10-01 PA.. Power of Attorney 2 View
2009-10-01 N417 Electronic Filing System Acknowledgment Receipt 2 View
2009-10-01 R3.73 Assignee showing of ownership per 37 CFR 3.73 2 View
2003-11-18 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-01-09 TRNA Transmittal of New Application 4 View
2002-01-09 SPEC Specification 15 View
2002-01-09 CLM Claims 3 View
2002-01-09 ABST Abstract 1 View
2002-01-09 DRW Drawings-only black and white line drawings 4 View
2002-01-09 OATH Oath or Declaration filed 3 View
2002-01-09 LET. Miscellaneous Incoming Letter 1 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
App. No.
10/040,490
Filed
2002-01-09
Granted
2004-02-03
Pub. No.
US20030013308A1
Art Unit
1765
PTA
0 days