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App. No. 10/061,285 · Confirmation No. 1693

RESIST MASK HAVING MEASUREMENT MARKS FOR MEASURING THE ACCURACY OF OVERLAY OF A PHOTOMASK DISPOSED ON SEMICONDUCTOR WAFER

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 Code Description Pages PDF
2002-02-04 TRNA Transmittal of New Application 2 View
2002-02-04 A.PE Preliminary Amendment 7 View
2002-02-04 SPEC Specification 9 View
2002-02-04 CLM Claims 5 View
2002-02-04 ABST Abstract 1 View
2002-02-04 DRW Drawings-only black and white line drawings 3 View
2002-02-04 OATH Oath or Declaration filed 5 View
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Quick Facts
App. No.
10/061,285
Filed
2002-02-04
Granted
2002-08-27
Pub. No.
US20020086549A1
Art Unit
1765
PTA
0 days