Granted Patent
Utility
US 6,562,188
· Confirmation No. 4754
RESIST MASK FOR MEASURING THE ACCURACY OF OVERLAID LAYERS
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⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2002-07-17 | TRNA |
Transmittal of New Application | 2 | View | |
| 2002-07-17 | A.PE |
Preliminary Amendment | 8 | View | |
| 2002-07-17 | SPEC |
Specification | 9 | View | |
| 2002-07-17 | CLM |
Claims | 5 | View | |
| 2002-07-17 | ABST |
Abstract | 1 | View | |
| 2002-07-17 | DRW |
Drawings-only black and white line drawings | 3 | View | |
| 2002-07-17 | OATH |
Oath or Declaration filed | 5 | View |
Inventors
Akiyuki Minami
Tokyo, JAPAN
Satoshi Machida
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/345
G03F7/70633
H10W46/501
H10P74/277
H10W46/101
H10W46/00
Prosecution
- Examiner
- POWELL, WILLIAM A
- Art Unit
- 1765
- Customer No.
- 26071
- Docket No.
- F98ED0058-DIV-CA2
- Confirmation No.
- 4754
Foreign Priority
10-362716
·
1998-12-21
·
JAPAN
Publication
- Pub. No.
- US20020182817A1
- Pub. Date
- 2002-12-05
Patent Term Adjustment
0days
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Quick Facts
- Patent No.
- US 6,562,188
- App. No.
- 10/196,413
- Filed
- 2002-07-17
- Granted
- 2003-05-13
- Pub. No.
- US20020182817A1
- Examiner
- POWELL, WILLIAM A
- Art Unit
- 1765
- PTA
- 0 days
External Links