Patent Application
Utility
App. No. 10/074,936
· Confirmation No. 8853
SEMICONDUCTOR DEVICE HAVING INTERCONNECTION IMPLEMENTED BY REFRACTORY METAL NITRIDE LAYER AND REFRACTORY METAL SILICIDE LAYER AND PROCESS OF FABRICATION THEREOF
Inventor:
Tetsuya Taguwa
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2002-02-13 | TRNA |
Transmittal of New Application | 5 | View | |
| 2002-02-13 | A.PE |
Preliminary Amendment | 2 | View | |
| 2002-02-13 | SPEC |
Specification | 19 | View | |
| 2002-02-13 | CLM |
Claims | 7 | View | |
| 2002-02-13 | ABST |
Abstract | 1 | View | |
| 2002-02-13 | DRW |
Drawings-only black and white line drawings | 6 | View | |
| 2002-02-13 | OATH |
Oath or Declaration filed | 2 | View |
Inventors
Tetsuya Taguwa
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/629
H10W20/425
H10W20/01
H10W20/035
H10W20/42
Prosecution
- Examiner
- PHAM, THANHHA S
- Art Unit
- 2813
- Customer No.
- 27667
- Docket No.
- NEC N99-1044 DIV
- Confirmation No.
- 8853
Foreign Priority
11-28370
·
1999-02-05
·
JAPAN
Publication
- Pub. No.
- US20020070456A1
- Pub. Date
- 2002-06-13
Patent Term Adjustment
-26days
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2004-02-12
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-19
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Quick Facts
- App. No.
- 10/074,936
- Filed
- 2002-02-13
- Granted
- 2003-05-27
- Pub. No.
- US20020070456A1
- Examiner
- PHAM, THANHHA S
- Art Unit
- 2813
- PTA
- -26 days
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