IP Library › Granted Patent US 8,089,142
Granted Patent B2
US 8,089,142 · App. 10/075,422 · Granted Jan 3, 2012

Methods and apparatus for a stacked-die interposer

Assignee: Micron Technology, Inc.
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,089,142
App. No.
10/075,422
Granted
Jan 3, 2012
Kind
B2
Abstract

An improved stacked-die package includes an interposer which improves the manufacturability of the package. A semiconductor package includes a package substrate having a plurality of bond pads; a first semiconductor device mounted on the package substrate, the first semiconductor device having a plurality of bond pads provided thereon; an interposer mounted on the first semiconductor device, the interposer having a first interposer bond pad and a second interposer bond pad, wherein the first and second interposer bond pads are electrically coupled; a second semiconductor device mounted on the interposer, the second semiconductor device having a plurality of bond pads provided thereon; a first bond wire connected to one of the plurality of bond pads on said first semiconductor and to the first interposer bond pad; and a second bond wire connected to the second interposer bond pad and to one of the plurality of bond pads on the semiconductor device.

Claims (25)

1. A stacked die package comprising:

a package substrate having a top side and a bottom side, the top side having a plurality of bond pads, and the bottom side having a ball-grid array pattern;

a first semiconductor device mounted on the top side of the package substrate, the first semiconductor device having a plurality of bond pads;

a silicon interposer mounted on the first semiconductor device, the interposer having a first interposer bond pad and a second interposer bond pad, wherein the first and second interposer bond pads are formed by a conductive trace, and wherein the interposer includes: an interposer substrate; a dielectric layer formed on the interposer substrate; the conductive trace formed on the dielectric layer; and a passivation layer formed on the conductive trace, the passivation layer having a plurality of windows to expose the conductive trace in areas defining the interposer bond pads;

a second semiconductor device mounted on the interposer, the second semiconductor device having a plurality of bond pads; and

a plurality of bond wires coupled between the bond pads of the package substrate, the first semiconductor device, the silicon interposer, and the second semiconductor device, wherein each of the plurality of bond wires is coupled between two adjacent layers of the stacked die package.

2. The stacked die package of claim 1 , wherein the interposer substrate comprises silicon.

3. The stacked die package of claim 1 , wherein the package substrate comprises a material selected from the group consisting of ceramic, polyimide, metal, glass-filled resin, and cyanate-glass.

4. The stacked die package of claim 1 , wherein the package substrate includes multilevel metallization.

5. The stacked die package of claim 1 , wherein the interposer passivation layer comprises silicon nitride.

6. A stacked die package comprising:

a substrate layer having a plurality of bond pads;

a first semiconductor layer having a plurality of bond pads, the first semiconductor layer mounted on the substrate layer;

a silicon interposer layer mounted on the first semiconductor layer, the interposer layer having a first bond pad and a second bond pad formed by a conductive trace extending at least partly within the interposer layer; and

a second semiconductor layer mounted on the silicon interposer layer, the second semiconductor layer having a plurality of bond pads.

7. The stacked die package of claim 6 , comprising a plurality of bond wires each coupled between a bond pad of one layer and a bond pad of an adjacent layer.

8. The stacked die package of claim 6 , wherein the silicon interposer layer comprises a substrate, a dielectric layer formed on the substrate, the conductive trace formed on the dielectric layer, and a passivation layer formed on the conductive trace, the passivation layer having a plurality of openings configured to expose the conductive trace and to form the first and second bond pads.

9. A die package comprising:

a substrate;

a first semiconductor mounted on the substrate;

a silicon interposer mounted on the first semiconductor device;

a second semiconductor mounted on the silicon interposer wherein the substrate, the first and second semiconductors, and the silicon interposer each comprise a plurality of bond pads; and

a plurality of bond wires each coupled between a bond pad of one layer and a bond pad of an adjacent layer.

10. The die package of claim 9 , wherein the silicon interposer comprises a plurality of conductive traces extending through the interposer, each conductive trace configured to form a first and a second bond pad and to electrically couple the first and second bond pads together.

11. The die package of claim 9 , wherein the silicon interposer comprises a plurality of conductive traces on the surface of the interposer, each conductive trace configured to electrically couple the first and second bond pads together.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 13, 2002
From: BROOKS, MICHAEL
To: MICHRON TECHNOLOGY, INC.
Reel/Frame 012593/0433 →
Continuity (1)
Related Publication 20030153122A1 · Aug 14, 2003