IP Library Granted Patent US 7,276,292
Granted Patent B2
US 7,276,292 · App. 10/087,566 · Granted Oct 2, 2007

Insulating substrate boards for semiconductor and power modules

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Quick Facts
Patent No.
US 7,276,292
App. No.
10/087,566
Granted
Oct 2, 2007
Kind
B2
Abstract

An insulating substrate board for a semiconductor of the present invention comprises a ceramic substrate board ( 2 ) and a metal alloy layer ( 3 ) consisting of aluminum formed on one surface portion of the ceramic substrate board ( 2 ), wherein the Vickers hardness of the metal alloy layer ( 3 ) is not less than 25 and not more than 40. The metal alloy layer ( 3 ) includes silicon of not less than 0.2% by weight and not more than 5% by weight. The ceramic substrate board ( 2 ) is made of a material selected from a group consisting of alumina. aluminum nitride, and silicon nitride. A power module of the present invention comprises a metal base plate ( 7 ), a ceramic substrate board ( 2 ), one surface of which is bonded to the metal base plate ( 7 ), and the other surface of which is bonded on a semiconductor tip ( 1 ), at least one surface portion of the ceramic substrate board ( 2 ) having a metal alloy layer ( 3 ) consisting of aluminum, wherein the Vickers hardness of the metal alloy layer ( 3 ) is not less than 25 and not more than 40.

Claims (94)

1. An insulating substrate board for a semiconductor comprising:

a ceramic substrate board; and

a metal alloy layer consisting essentially of aluminum of not less than 98% by weight and of silicon of not less than 0.2% by weight and not more than 0.5% by weight,

wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board, and wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

2. The insulating substrate board according to claim 1 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board by direct bonding.

3. The insulating substrate board according to claim 1 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board through a brazing material layer.

4. An insulating substrate board for a semiconductor comprising:

a ceramic substrate board; and

a metal alloy layer consisting essentially of aluminum, silicon of about 0.6% by weight, and Mn of about 1.5% by weight.

wherein the metal alloy layer is bonded by direct bonding on at least one surface portion of the ceramic substrate board, and wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

5. An insulating substrate board for a semiconductor comprising:

a ceramic substrate board; and

a metal alloy layer consisting essentially of aluminum, silicon of not less than 0.1% by weight and not more than 0.4% by weight, and Mg of not less than 0.5% by weight and not more than 1% by weight,

wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board, and wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

6. The insulating substrate board according to claim 5 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board by direct bonding.

7. The insulating substrate board according to claim 5 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board through a brazing material layer.

8. An insulating substrate board for a semiconductor comprising:

a ceramic substrate board; and

a metal alloy layer consisting essentially of aluminum and of Cu of not less than 1.0% by weight and not more than 2.0% by weight,

wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board, and wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

9. The insulating substrate board according to claim 8 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board by direct bonding.

10. The insulating substrate board according to claim 8 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board through a brazing material layer.

11. An insulating substrate board for a semiconductor comprising:

a ceramic substrate board; and

a metal alloy layer consisting essentially of aluminum and of Zn of about 2.0% by weight,

wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board, and wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

12. The insulating substrate board according to claim 11 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board by direct bonding.

13. The insulating substrate board according to claim 11 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board through a brazing material layer.

14. An insulating substrate board for a semiconductor comprising:

a ceramic substrate board; and

metal alloy layers consisting essentially of aluminum, silicon of about 0.1% by weight, and Cu of about 1.0% by weight,

wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board, and wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

15. The insulating substrate board according to claim 14 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board by direct bonding.

16. The insulating substrate board according to claim 14 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board through a brazing material layer.

17. An insulating substrate board for a semiconductor comprising:

a ceramic substrate board; and

a metal alloy layer consisting essentially of aluminum, Si of about 0.1% by weight, Cu of about 1.0% by weight, and Mg of about 0.1% by weight.

wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board, nd wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

18. The insulating substrate board according to claim 17 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board by direct bonding.

19. The insulating substrate board according to claim 17 , wherein the metal alloy layer is bonded on at least one surface portion of the ceramic substrate board through a brazing material layer.

20. A power module comprising:

a ceramic substrate board;

metal alloy layers consisting essentially of aluminum of not less than 98% by weight and of silicon of not less than 0.2% by weight and not more than 0.5% by weight, wherein the metal alloy layers are bonded on both surfaces of the ceramic substrate board;

a metal base plate bonded to one of the metal alloy layers; and

a semiconductor tip formed on the other of the metal alloy layer,

wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

21. The power module according to claim 20 , wherein the metal alloy layers are bonded on the ceramic substrate board by direct bonding.

22. The power module according to claim 20 , wherein the metal alloy layers are bonded on the ceramic substrate board through a brazing material layer.

23. A power module comprising:

a ceramic substrate board;

metal alloy layers consisting essentially of aluminum, silicon of about 0.6% by weight, and Mn of about 1.5% by weight, wherein the metal alloy layers are bonded on both surfaces of the ceramic substrate board;

a metal base plate bonded to one of the metal alloy layers; and

a semiconductor tip formed on the other of the metal alloy layer,

wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

24. A power module comprising:

a ceramic substrate board;

metal alloy layers consisting essentially of aluminum, silicon of not less than 0.1% by weight and not more than 0.4% by weight, and Mg of not less than 0.5% by weight and not more than 1% by weight, wherein the metal alloy layers are bonded on both surfaces of the ceramic substrate board;

a metal base plate bonded to one of the metal alloy layers; and

a semiconductor tip formed on the other of the metal alloy layer,

wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

25. The power module according to claim 24 , wherein the metal alloy layers are bonded on the ceramic substrate board by direct bonding.

26. The power module according to claim 24 , wherein the metal alloy layers are bonded on the ceramic substrate board through a brazing material layer.

27. A power module comprising:

a ceramic substrate board;

metal alloy layers consisting essentially of aluminum and of Cu of not less than 1.0% by weight and not more than 2.0% by weight, wherein the metal alloy layers are bonded on both surfaces of the ceramic substrate board;

a metal base plate bonded to one of the metal alloy layers; and

a semiconductor tip formed on the other of the metal alloy layer,

wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

28. The power module according to claim 27 , wherein the metal alloy layers are bonded on the ceramic substrate board by direct bonding.

29. The power module according to claim 27 , wherein the metal alloy layers are bonded on the ceramic substrate board through a brazing material layer.

30. A power module comprising:

a ceramic substrate board;

metal alloy layers consisting essentially of aluminum and of Zn of about 2.0% by weight, wherein the metal alloy layers are bonded on both surfaces of the ceramic substrate board;

a metal base plate bonded to one of the metal alloy layers; and

a semiconductor tip formed on the other of the metal alloy layer,

wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

31. The power module according to claim 30 , wherein the metal alloy layers are bonded on the ceramic substrate board by direct bonding.

32. The power module according to claim 30 , wherein the metal alloy layers are bonded on the ceramic substrate board through a brazing material layer.

33. A power module comprising:

a ceramic substrate board;

metal alloy layers consisting essentially of aluminum, silicon of about 0.1% by weight, and Cu of about 1.0% by weight, wherein the metal alloy layers are bonded on both surfaces of the ceramic substrate board;

a metal base plate bonded to one of the metal alloy layers; and

a semiconductor tip formed on the other of the metal alloy layer,

wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

34. The power module according to claim 33 , wherein the metal alloy layers are bonded on the ceramic substrate board by direct bonding.

35. The power module according to claim 33 , wherein the metal alloy layers are bonded on the ceramic substrate board through a brazing material layer.

36. A power module comprising:

a ceramic substrate board;

metal alloy layers consisting essentially of aluminum, Si of about 0.1% by weight, Cu of about 1.0% by weight, and Mg of about 0.1% by weight, wherein the metal alloy layers are bonded on both surfaces of the ceramic substrate board;

a metal base plate bonded to one of the metal alloy layers; and

a semiconductor tip formed on the other of the metal alloy layer,

wherein a Vickers hardness of the metal alloy layer is not less than 25 and not more than 35.

37. The power module according to claim 36 , wherein the metal alloy layers are bonded on the ceramic substrate board by direct bonding.

38. The power module according to claim 37 , wherein the metal alloy layers are bonded on the ceramic substrate board through a brazing material layer.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 11, 2008
From: DOWA HOLDINGS CO., LTD.
To: DOWA METALTECH CO., LTD.
Reel/Frame 020354/0632 →
CHANGE OF NAME Recorded Nov 5, 2007
From: DOWA MINING CO., LTD.
To: DOWA HOLDINGS CO., LTD.
Reel/Frame 020121/0161 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 1, 2002
From: FURO, MASAHIRO; OSANAI, HIDEYO
To: DOWA MINING CO., LTD.
Reel/Frame 012668/0716 →