Semiconductor switching device
View Patent ↗A semiconductor switching device includes two FETs with different device characteristics, a common input terminal, and two output terminals. The gate width of each FET is about 400 μm, and the maximum power required for the device operation is maintained by a lager conductivity of the channel layer of one FET and by a lower conductivity of the channel layer of another FET. The device operates at frequencies of 2.4 GHz or higher without use of shunt FET.
1. A semiconductor switching device comprising:
a first field effect transistor and a second field effect transistor, each comprising a source electrode, a gate electrode and a drain electrode which are formed on a channel layer of the respective transistor, each of the first transistor and the second transistor having a gate width equal to or less than 400 μm, the first transistor and the second transistor having different saturation currents;
a common input terminal connected to the source electrode or the drain electrode of the first transistor and connected to the source electrode or the drain electrode of the second transistor;
a first output terminal connected to the source electrode or the drain electrode of the first transistor which is not connected to the common input terminal; and
a second output terminal connected to the source electrode or the drain electrode of the second transistor which is not connected to the common input terminal,
wherein gates of the first transistor and the second transistor receive control signals so that when one of the transistors opens as a switching element, the other of the transistors closes as another switching element,
the transistor with the higher saturation current has a higher pinch-off voltage than the transistor with the lower saturation current, and
a difference between a reverse bias voltage applied to the transistor with the lower saturation current and a pinch-off voltage of the transistor with the lower saturation current is such that the transistor with the lower saturation current withstands a predetermined maximum power when the transistor with the higher saturation current allows the predetermined power to pass therethrough.
2. The semiconductor switching device of claim 1 , wherein the channel layers of the first transistor and the second transistor have different impurity concentrations.
3. The semiconductor switching device of claim 1 , wherein the channel layers of the first transistor and the second transistor have different depths.
4. The semiconductor switching device of claim 1 , further comprising a semi-insulating GaAs substrate on which the channel layers are formed.
5. The semiconductor switching device of claim 1 , wherein the gate electrodes of the first transistor and the second transistor form Schottky contacts with the channel layer and the source and drain electrodes of the first transistor and the second transistor form ohmic contacts with the channel layer.
6. The semiconductor switching device of claim 1 , wherein the saturation current of the first transistor is larger than the saturation current of the second transistor by 10% or more.
7. The semiconductor switching device of claim 1 , wherein a pinch-off voltage of the first transistor is larger than a pinch-off voltage of the second transistor by 0.2 volt or more.
8. The semiconductor switching device of claim 1 , wherein the pinch-off voltage of the transistor with the higher saturation current is larger than the pinch-off voltage of the transistor with the lower saturation current by 0.2 volt or more.
9. The semiconductor switching device of claim 1 , wherein the gate width of the first transistor is equal to the gate width of the second transistor.