Printed circuit board manufacture
View Patent ↗A process used during manufacture of printed circuit boards comprises protecting metal pads and/or through-holes to provide a tarnish-resistant and solderable coating. In the method, the pads and/or through-holes are bright-etched, metal plated, preferably by an immersion process, and treated with a tarnish inhibitor. The tarnish inhibitor may be incorporated into the immersion plating bath. The metal plating is usually with silver or bismuth and the pads and/or through-holes comprise copper.
1. A plating solution comprising:
a solvent;
metallic ions dissolved in the solvent; and
a tarnish inhibitor in the solvent, the tarnish inhibitor characterized in that it does not cause the dissolved metallic ions to precipitate in the solution.
2. The plating solution of claim 1 , wherein the metallic ions are selected from the group consisting of nickel, silver, tin, lead, palladium, cobalt, gold, platinum, bismuth and combinations thereof.
3. The plating solution of claim 2 , wherein the metallic ions include silver ions.
4. The plating solution of claim 1 , wherein the solvent comprises water.
5. The plating solution of claim 1 , wherein the tarnish inhibitor is present at a concentration in the range from 0.001 to 50 g/l.
6. The plating solution of claim 5 , wherein the tarnish inhibitor is present at a concentration in the range from 0.05 to 30 g/l.
7. The plating solution of claim 6 , wherein the tarnish inhibitor is present at a concentration in the range from 0.1 to 20 g/l.
8. The plating solution of claim 7 , wherein the tarnish inhibitor is present at a concentration of less than 10 g/l.
9. The plating solution of claim 1 , further comprising a complexing agent for the dissolved metallic ions.
10. The plating solution of claim 9 , wherein the complexing agent includes a multidentate ligand.
11. The plating solution of claim 10 , wherein the complexing agent includes an oxygen-containing ligand.
12. The plating solution of claim 1 , wherein the complexing agent is present at a concentration that is the stoichiometric equivalent or greater than the concentration of the dissolved metallic ions.
13. The plating solution of claim 1 , wherein the complexing agent is present at a concentration of 0.1 to 250 g/l.
14. The plating solution of claim 13 , wherein the complexing agent is present at a concentration of 2 to 200 g/l.
15. The plating solution of claim 14 , wherein the complexing agent is present at a concentration of 10 to 100 g/l.
16. The plating solution of claim 15 , wherein the complexing agent is present at a concentration of about 50 g/l.
17. The plating solution of claim 1 , wherein the plating solution has a pH in the range from 2 to 12.
18. The plating solution of claim 17 , wherein the plating solution has a pH in the range from 4 to 10.
19. The plating solution of claim 18 , wherein the plating solution has a pH of about 7.
20. A silver-plating solution comprising:
water;
a source of silver ions dissolved in the water; and
a tarnish inhibitor in the water at a concentration from 0.0001 to 5% by weight of the silver-plating solution, the tarnish inhibitor characterized in that it does not cause the dissolved silver ions to precipitate in the solution.
21. The silver-plating solution of claim 20 , wherein the tarnish inhibitor is at a concentration in the range from 0.005 to 3% by weight.
22. The silver-plating solution of claim 20 , wherein the tarnish inhibitor is at a concentration in the range from 0.01 to 2% by weight.
23. The silver-plating solution of claim 20 , wherein the plating solution has a pH in the range from 4 to 10.
24. The silver-plating solution of claim 23 , further comprising a complexing agent for the silver ions.
25. The silver-plating solution of claim 24 , wherein the complexing agent is a multidentate ligand.
26. The silver-plating solution of claim 25 , wherein the complexing agent is present at a concentration that is the stoichiometric equivalent or greater than the concentration of the dissolved metallic ions.
27. The silver-plating solution of claim 26 , wherein the complexing agent is present at a concentration of 0.1 to 250 g/l.
28. An aqueous plating composition suitable for forming an immersion plating of a first metal having a first electropositivity on a substrate formed of a second metal having a second electropositivity, the first electropositivity being greater than the second electropositivity, the composition comprising:
ions of the first metal;
a complexing agent for the ions of the first metal; and
a tarnish inhibitor for the first metal, the composition being substantially free of any reducing agent for the ions of the first metal.
29. A composition according to claim 28 , wherein the tarnish inhibitor composes from 0.001 to 5% by weight of the composition.
30. A composition according to claim 28 , wherein the ions of the first metal are selected from the group consisting of nickel ions, silver ions, tin ions, lead ions, palladium ions, cobalt ions, gold ions, platinum ions, bismuth ions and mixtures thereof.
31. A composition according to claim 30 , wherein the ions of the first metal are silver ions.