Memory manufacturing process with bitline isolation
View Patent ↗A method of manufacturing an integrated circuit is provided with a semiconductor substrate having a core region and a periphery region. A charge-trapping dielectric layer is deposited in the core region, and a gate dielectric layer is deposited in the periphery region. Bitlines are formed in the semiconductor substrate in the core region and not in the periphery region. A wordline-gate layer is formed and implanted with dopant in the core region and not in the periphery region. A wordline and gate are formed. Source/drain junctions are implanted with dopant in the semiconductor substrate around the gate, and the gate is implanted with a gate doping implantation in the periphery region and not in the core region.
1. A method of manufacturing an integrated circuit comprising:
providing a semiconductor substrate having a core region and a periphery region;
implanting a threshold adjustment implant in the semiconductor substrate;
depositing a charge-trapping dielectric material in the core region;
depositing a gate dielectric material in the periphery region;
depositing bitline photoresist layer over the gate dielectric material in the periphery region;
forming bitlines in the semiconductor substrate in the core region and not in the periphery region, the bitlines spaced apart with the threshold adjustment implant in between thereof;
removing the bitline photoresist layer;
forming a wordline-gate material;
implanting the wordline-gate material with wordline dopant in the core region and not in the periphery region;
forming a wordline and a gate;
implanting the semiconductor substrate around the gate with source/drain junctions; and
implanting the gate with a gate dopant in the periphery region and not in the core region, the gate dopant the same type dopant as the wordline dopant.
2. The method of manufacturing an integrated circuit as claimed in claim 1 , wherein:
implanting the threshold adjustment implant includes implanting the threshold adjustment implant using a first type dopant; and
implanting the wordline-gate material and implanting the gate using a second type dopant different from the first type dopant.
3. The method of manufacturing an integrated circuit as claimed in claim 1 , wherein:
providing the semiconductor substrate including providing a substrate having a first type dopant; and
implanting the wordline-gate material and implanting the gate using a second type dopant different from the first type dopant.
4. The method of manufacturing an integrated circuit as claimed in claim 1 , wherein:
providing the semiconductor substrate including providing a substrate having a first type dopant; and
forming the bitlines using a second type dopant different from the first type dopant.
5. The method of manufacturing an integrated circuit as claimed in claim 1 , wherein the charge-trapping material comprises:
a first dielectric material,
a charge-trapping material over the first dielectric material, and
a second dielectric material over the charge-trapping material.
6. A method of manufacturing an integrated circuit comprising:
providing a silicon substrate having a core region and a periphery region;
implanting a threshold adjustment implant in the silicon substrate;
depositing a charge-trapping dielectric layer on the silicon substrate in the core region;
depositing a gate dielectric layer on the silicon substrate in the periphery region;
depositing a bitline photoresist layer over the gate dielectric layer in the periphery region;
implanting bitlines in the silicon substrate, the bitlines spaced apart with the threshold adjustment implant in between thereof;
removing the bitline photoresist layer;
depositing a wordline-gate layer over the charge-trapping dielectric layer and the gate dielectric layer;
processing a periphery photoresist layer over the wordline-gate layer to cover the periphery region;
implanting the wordline-gate layer with dopant in the core region to form a wordline implant;
removing the periphery photoresist layer;
forming a wordline having the wordline implant and a gate;
forming spacers around the wordline and the gate;
processing a core photoresist layer over the wordline and the gate to cover the core region;
implanting the silicon substrate around the spacer around the gate with source/drain junctions;
implanting the gate with a gate dopant, the gate dopant of the same type dopant as the wordline dopant; and
removing the core photoresist layer.
7. The method of manufacturing an integrated circuit as claimed in claim 6 , wherein:
implanting the threshold adjustment implant includes implanting the threshold adjustment implant using a first type dopant; and
implanting the wordline-gate layer and implanting the gate using a second type dopant different from the first type dopant.
8. The method of manufacturing an integrated circuit as claimed in claim 6 , wherein:
providing the silicon substrate including providing a substrate having a first type dopant; and
implanting the wordline-gate layer and implanting the gate using a second type dopant different from the first type dopant.
9. The method of manufacturing an integrated circuit as claimed in claim 6 , wherein:
providing the silicon substrate including providing a substrate having a first type dopant; and
forming the bitlines using a second type dopant different from the first type dopant.
10. The method of manufacturing an integrated circuit as claimed in claim 6 wherein the charge-trapping material comprises:
a first dielectric material,
a charge-trapping material over the first dielectric material, and
a second dielectric material over the charge-trapping material.
11. A method of manufacturing an integrated circuit comprising:
providing a p-type silicon substrate having a core region and a periphery region;
implanting a threshold adjustment implant in the p-type silicon substrate;
depositing a charge-trapping dielectric layer on the p-type silicon substrate in the core region;
depositing a gate oxide on the p-type silicon substrate in the periphery region;
depositing a bitline photoresist lager over the gate oxide in the periphery region;
implanting n-type bitlines in the p-type silicon substrate, the n-type bitlines spaced apart with the threshold adjustment implant in between thereof;
removing the bitline photoresist layer;
depositing a polysilicon layer over the charge-trapping dielectric layer and the gate oxide;
processing a periphery photoresist layer over the polysilicon layer to cover the periphery region;
implanting the polysilicon layer in the core region to have a wordline implant of an n-type dopant;
removing the periphery photoresist layer;
forming a polysilicon wordline with the wordline implant and a polysilicon gate;
forming a spacer around the polysilicon wordline and the polysilicon gate;
processing a core photoresist layer over the polysilicon wordline and the polysilicon gate to cover the core region;
implanting the p-type silicon substrate around the spacer with source/drain junctions;
implanting the polysilicon gate with a gate implant of an n-type dopant; and
removing the core photoresist layer.
12. The method of manufacturing an integrated circuit as claimed in claim 11 , wherein:
implanting the p-type silicon substrate around the spacer with the source/drain junctions includes implanting the source/drain junctions with an n-type dopant in the periphery region.
13. The method of manufacturing an integrated circuit as claimed in claim 11 , wherein implanting the threshold adjustment implant includes implanting the threshold adjustment implant with a p-type dopant in the p-type silicon substrate.
14. The method of manufacturing an integrated circuit as claimed in claim 11 , wherein depositing the charge-trapping dielectric layer comprises depositing:
a first oxide,
a nitride over the first oxide, and
a second oxide over the nitride.