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App. No. 10/152,268 · Confirmation No. 6231

Phase-shifting mask and method of fabricating the same

Inventor: Haruo Iwasaki
Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2004-09-28 ABN Abandonment 2 View
2004-01-21 CTNF Non-Final Rejection 5 View
2004-01-21 1449 List of References cited by applicant and considered by examiner 1 View
2004-01-21 892 List of references cited by examiner 1 View
2004-01-21 FWCLM Index of Claims 1 View
2004-01-21 SRFW Search information including classification, databases and other search related notes 1 View
2004-01-07 SRNT Examiner's search strategy and results 1 View
2002-06-24 FRPR Certified Copy of Foreign Priority Application 27 View
2002-06-17 CFILE Request for Corrected Filing Receipt 4 View
2002-05-21 TRNA Transmittal of New Application 2 View
2002-05-21 SPEC Specification 12 View
2002-05-21 CLM Claims 4 View
2002-05-21 ABST Abstract 1 View
2002-05-21 DRW Drawings-only black and white line drawings 9 View
2002-05-21 OATH Oath or Declaration filed 3 View
2002-05-21 WFEE Fee Worksheet (SB06) 1 View
2002-05-21 WFEE Fee Worksheet (SB06) 1 View
2002-05-21 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2002-05-21 FOR Foreign Reference 13 View
2002-05-21 FOR Foreign Reference 8 View
2002-05-21 FOR Foreign Reference 8 View
2002-05-21 FOR Foreign Reference 9 View
2002-05-21 FOR Foreign Reference 5 View
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Quick Facts
App. No.
10/152,268
Filed
2002-05-21
Pub. No.
US20020177049A1
Examiner
SAGAR, KRIPA
Art Unit
1756