IP Library › Granted Patent US 6,797,638
Granted Patent Utility
US 6,797,638 · Confirmation No. 8801

PLASMA-ETCHING PROCESS FOR MOLYBDENUM SILICON NITRIDE LAYERS ON HALF-TONE PHASE MASKS BASED ON GAS MIXTURES CONTAINING MONOFLUOROMETHANE AND OXYGEN

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Quick Facts
Patent No.
US 6,797,638
App. No.
10/159,262
Filed
2002-05-31
Granted
2004-09-28
Pub. No.
US20020192958A1
Examiner
TRAN, BINH X
Art Unit
1765
PTA
-5 days