IP Library › Granted Patent US 6,800,553
Granted Patent Utility Small
US 6,800,553 · Confirmation No. 8474

METHOD FOR MANUFACTURING A SILICIDE LAYER OF SEMICONDUCTOR DEVICE

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2004-08-30 IFEE Issue Fee Payment (PTO-85B) 4 View
2004-08-30 DRW Drawings-only black and white line drawings 1 View
2004-06-10 NOA Notice of Allowance and Fees Due (PTOL-85) 3 View
2004-06-10 NOA Notice of Allowance and Fees Due (PTOL-85) 4 View
2004-06-10 1449 List of References cited by applicant and considered by examiner 1 View
2004-06-10 892 List of references cited by examiner 1 View
2004-06-10 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2004-06-10 FWCLM Index of Claims 1 View
2004-06-10 SRFW Search information including classification, databases and other search related notes 1 View
2004-06-10 DRW Drawings-only black and white line drawings 1 View
2004-05-23 SRNT Examiner's search strategy and results 3 View
2002-06-26 TRNA Transmittal of New Application 3 View
2002-06-26 SPEC Specification 10 View
2002-06-26 CLM Claims 5 View
2002-06-26 ABST Abstract 1 View
2002-06-26 DRW Drawings-only black and white line drawings 4 View
2002-06-26 OATH Oath or Declaration filed 4 View
2002-06-26 WFEE Fee Worksheet (SB06) 1 View
2002-06-26 WFEE Fee Worksheet (SB06) 1 View
2002-06-26 IDS Information Disclosure Statement (IDS) Form (SB08) 1 View
2002-06-26 FRPR Certified Copy of Foreign Priority Application 15 View
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Quick Facts
Patent No.
US 6,800,553
App. No.
10/180,760
Filed
2002-06-26
Granted
2004-10-05
Pub. No.
US20030003731A1
Examiner
ANYA, IGWE U
Art Unit
2825
PTA
-37 days