IP Library › Granted Patent US 7,094,695

Granted Patent B2

US 7,094,695 · App. 10/225,587 · Granted Aug 22, 2006

Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization

Assignee: Micron Technology, Inc.

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Quick Facts

Patent No.: US 7,094,695
App. No.: 10/225,587
Granted: Aug 22, 2006
Kind: B2

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Abstract

Conditioning apparatuses and methods for conditioning polishing pads used for mechanical and/or chemical-mechanical planarization of micro-device workpieces are disclosed herein. In one embodiment, a method for conditioning a polishing pad used for polishing a micro-device workpiece includes monitoring surface condition in a first region of the polishing pad and adjusting at least one of a rotational velocity of the polishing pad, a downforce on the polishing pad, and a sweep velocity of the end effector in response to the monitored surface condition to provide a desired texture in the first region. In another embodiment, an apparatus for conditioning the polishing pad includes an end effector, a monitoring device, and a controller operatively coupled to the end effector and the monitoring device. The controller has a computer-readable medium containing instructions to perform a conditioning method, such as the above-mentioned method.

Claims (77)

1. A method for conditioning a polishing pad used for polishing a micro-device workpiece, comprising:

determining surface condition in a first region of the polishing pad;

determining surface condition in a second region of the polishing pad;

adjusting at least one of a relative velocity between the polishing pad and an end effector, an existing downforce on the polishing pad, and a sweep velocity of the end effector in response to the determined surface condition of the first region to provide a desired first surface texture in the first region; and

adjusting at least one of the relative velocity between the polishing pad and the end effector, the existing downforce on the polishing pad, and the sweep velocity of the end effector in response to the determined surface condition of the second region to provide a desired second surface texture in the second region.

2. The method of claim 1 wherein determining surface condition in a first region comprises sensing surface texture in the first region, and wherein determining surface condition in a second region comprises sensing surface texture in the second region.

3. The method of claim 1 wherein determining surface condition in a first region comprises sensing surface roughness in the first region, and wherein determining surface condition in a second region comprises sensing surface roughness in the second region.

4. The method of claim 1 wherein determining surface condition in a first region comprises sensing surface asperities in the first region, and wherein determining surface condition in a second region comprises sensing surface asperities in the second region.

5. The method of claim 1 , further comprising rotating the polishing pad, wherein determining surface condition in a first region and determining surface condition in a second region occur while rotating the polishing pad.

6. The method of claim 1 wherein determining surface condition in a first region and determining surface condition in a second region occur while the polishing pad is stationary.

7. The method of claim 1 , further comprising engaging the end effector with the polishing pad, wherein determining surface condition in a first region and determining surface condition in a second region occur continuously while engaging the end effector.

8. The method of claim 1 , further comprising engaging the end effector with the polishing pad, wherein determining surface condition in a first region and determining surface condition in a second region occur intermittently while engaging the end effector.

9. The method of claim 1 wherein determining surface condition in a first region and determining surface condition in a second region occur concurrently.

10. The method of claim 1 wherein determining surface condition in a first region occurs before determining surface condition in a second region.

11. The method of claim 1 wherein determining surface condition in a first region and determining surface condition in a second region comprise measuring a frictional force in a plane defined by the polishing pad.

12. The method of claim 1 wherein determining surface condition in a first region and determining surface condition in a second region comprise optically analyzing the polishing pad.

13. The method of claim 1 wherein the desired first surface texture and the desired second surface texture are different.

14. A method for conditioning a polishing pad used for polishing a micro-device workpiece, comprising:

monitoring surface condition in a first region of the polishing pad with a monitoring device; and

adjusting at least one of a rotational velocity of the polishing pad, a downforce on the polishing pad, and a sweep velocity of an end effector in response to the monitored surface condition to provide a desired texture in the first region.

15. The method of claim 14 wherein monitoring surface condition in a first region comprises sensing surface texture in the first region.

16. The method of claim 14 wherein monitoring surface condition in a first region comprises sensing surface roughness in the first region.

17. The method of claim 14 wherein monitoring surface condition in a first region comprises sensing surface asperities in the first region.

18. The method of claim 14 , further comprising rotating the polishing pad, wherein monitoring surface condition in a first region occurs while rotating the polishing pad.

19. The method of claim 14 wherein monitoring surface condition in a first region occurs while the polishing pad is stationary.

20. The method of claim 14 , further comprising engaging the end effector with the polishing pad, wherein monitoring surface condition in a first region occurs continuously while engaging the end effector.

21. The method of claim 14 , further comprising engaging the end effector with the polishing pad, wherein monitoring surface condition in a first region occurs intermittently while engaging the end effector.

22. The method of claim 14 wherein monitoring surface condition in a first region comprises measuring a frictional force in a plane defined by the polishing pad.

23. The method of claim 14 wherein monitoring surface condition in a first region comprises optically analyzing the first region of the polishing pad.

24. The method of claim 14 , further comprising monitoring surface condition in a second region of the polishing pad.

25. The method of claim 14 wherein the desired texture is a desired first texture, and wherein the method further comprises:

monitoring surface condition in a second region of the polishing pad; and

adjusting at least one of the rotational velocity of the polishing pad, the downforce on the polishing pad, and the sweep velocity of the end effector to provide a desired second texture in the second region.

26. The method of claim 14 , further comprising monitoring surface condition in a second region of the polishing pad, wherein monitoring surface condition in the second region occurs concurrently with monitoring surface condition in the first region.

27. A method for conditioning a polishing pad used for polishing a micro-device workpiece, comprising:

determining roughness of surface texture in a first region of the polishing pad; and

controlling at least one of a relative velocity between the polishing pad and an end effector, a downforce on the polishing pad, and a sweep velocity of an end effector in response to the determined roughness of surface texture to provide a desired texture in the first region.

28. The method of claim 27 wherein determining roughness of surface texture in a first region comprises detecting surface asperities in the first region.

29. The method of claim 27 wherein determining roughness of surface texture in a first region comprises measuring a frictional force in a plane defined by the polishing pad.

30. The method of claim 27 wherein determining roughness of surface texture in a first region comprises optically analyzing the first region of the polishing pad.

31. The method of claim 27 wherein the desired texture is a desired first texture, and the method further comprises:

determining roughness of surface texture in a second region of the polishing pad; and

controlling at least one of the relative velocity between the polishing pad and the end effector, the downforce on the polishing pad, and the sweep velocity of the end effector in response to the determined roughness to provide a desired second texture in the second region.

32. A method for conditioning a polishing pad used for polishing a micro-device workpiece, comprising:

analyzing surface texture in a first region of the polishing pad;

analyzing surface texture in a second region of the polishing pad;

controlling at least one of a rotational velocity of the polishing pad, an existing downforce on the polishing pad, and a sweep velocity of an end effector in response to the analyzed surface texture of the first region to provide a desired first surface texture in the first region; and

controlling at least one of the rotational velocity of the polishing pad, the existing downforce on the polishing pad, and the sweep velocity of the end effector in response to the analyzed surface texture of the second region to provide a desired second surface texture in the second region.

33. The method of claim 32 wherein analyzing surface texture in a first region comprises sensing surface texture in the first region, and wherein analyzing surface texture in a second region comprises sensing surface texture in the second region.

34. The method of claim 32 wherein analyzing surface texture in a first region comprises sensing surface roughness in the first region, and wherein analyzing surface texture in a second region comprises sensing surface roughness in the second region.

35. The method of claim 32 wherein analyzing surface texture in a first region comprises sensing surface asperities in the first region, and wherein analyzing surface texture in a second region comprises sensing surface asperities in the second region.

36. The method of claim 32 wherein analyzing surface texture in a first region comprises measuring a frictional force in the first region in a plane defined by the polishing pad, and wherein analyzing surface texture in a second region comprises measuring the frictional force in the second region in the plane defined by the polishing pad.

37. The method of claim 32 wherein analyzing surface texture in a first region comprises optically analyzing the first region of the polishing pad, and wherein analyzing surface texture in a second region comprises optically analyzing the second region.

38. The method of claim 32 wherein the desired first texture is different from the desired second texture.

39. A method for conditioning a polishing pad used for polishing a micro-device workpiece, comprising:

engaging an end effector with the polishing pad and moving at least one of the end effector and the polishing pad relative to the other;

monitoring surface condition in a first region of the polishing pad; and

providing a desired texture in the first region of the polishing pad by regulating at least one of a relative velocity between the polishing pad and the end effector, a downforce on the polishing pad, and a sweep velocity of the end effector in response to the monitored surface condition of the first region.

40. The method of claim 39 wherein monitoring surface condition in a first region comprises sensing surface texture in the first region.

41. The method of claim 39 wherein monitoring surface condition in a first region comprises sensing surface roughness in the first region.

42. The method of claim 39 wherein monitoring surface condition in a first region comprises sensing surface asperities in the first region.

43. The method of claim 39 wherein monitoring surface condition in a first region occurs continuously while engaging the end effector.

44. The method of claim 39 wherein monitoring surface condition in a first region occurs intermittently while engaging the end effector.

45. The method of claim 39 wherein monitoring surface condition in a first region comprises measuring a frictional force in a plane defined by the polishing pad.

46. The method of claim 39 wherein monitoring surface condition in a first region comprises optically analyzing the first region.

47. The method of claim 39 , further comprising monitoring surface condition in a second region of the polishing pad.

48. The method of claim 39 wherein a desired texture is a desired first texture, and wherein the method further comprises:

monitoring surface condition in a second region of the polishing pad; and

providing a desired second texture in the second region of the polishing pad by regulating at least one of the relative velocity between the polishing pad and the end effector, the downforce on the polishing pad, and the sweep velocity of the end effector in response to the monitored surface condition of the second region.

49. The method of claim 39 , further comprising monitoring surface condition in a second region of the polishing pad, wherein monitoring surface condition in the second region occurs concurrently with monitoring surface condition in the first region.

50. A method for conditioning a polishing pad used for polishing a micro-device workpiece, comprising:

engaging an end effector with the polishing pad and moving at least one of the end effector and the polishing pad relative to the other;

determining roughness of surface texture in a first region of the polishing pad; and

providing a desired texture in the first region of the polishing pad by adjusting at least one of a rotational velocity of the polishing pad, a downforce on the polishing pad, and a sweep velocity of the end effector in response to the determined roughness of surface texture.

51. The method of claim 50 wherein determining roughness of surface texture in a first region comprises detecting surface asperities in the first region.

52. The method of claim 50 wherein determining roughness of surface texture in a first region comprises measuring a frictional force in a plane defined by the polishing pad.

53. The method of claim 50 wherein determining roughness of surface texture in a first region comprises optically analyzing the first region.

Assignments (1)

ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 21, 2002

From: TAYLOR, THEODORE M.

To: MICRON TECHNOLOGY, INC.

Reel/Frame 013225/0234 →

Continuity (1)

Related Publication 20040038534A1 · Feb 26, 2004